Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography

High-resolution kagome lattice structures with feature sizes down to the sub-50 nm regime are fabricated using diffraction-based extreme ultraviolet interference lithography. The resulting interference pattern of multiple beams is sensitive to the relative phase of the interfering beams. The precise...

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Bibliographic Details
Published in:Applied physics letters 2012-08, Vol.101 (9), p.93104
Main Authors: Wang, Li, Terhalle, Bernd, Guzenko, Vitaliy A., Farhan, Alan, Hojeij, Mohamad, Ekinci, Yasin
Format: Article
Language:English
Subjects:
Beams (radiation)
Diffraction gratings
Electron beam lithography
Interference
Kagome lattice
Lithography
Plasmonics
Ultraviolet
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Summary:High-resolution kagome lattice structures with feature sizes down to the sub-50 nm regime are fabricated using diffraction-based extreme ultraviolet interference lithography. The resulting interference pattern of multiple beams is sensitive to the relative phase of the interfering beams. The precise control of their phases is achieved by precise positioning of transmission diffraction gratings on a mask using a high-end electron beam lithography tool. The presented method may find applications in providing high-resolution and large-area kagome lattice structures for studies on frustrated magnetic systems, photonic crystals, and plasmonics.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4748758