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Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry

The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile par...

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Published in:Optics letters 2012-12, Vol.37 (24), p.5229-5231
Main Authors: Henn, Mark-Alexander, Heidenreich, Sebastian, Gross, Hermann, Rathsfeld, Andreas, Scholze, Frank, Bär, Markus
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Language:English
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cited_by cdi_FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3
cites cdi_FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3
container_end_page 5231
container_issue 24
container_start_page 5229
container_title Optics letters
container_volume 37
creator Henn, Mark-Alexander
Heidenreich, Sebastian
Gross, Hermann
Rathsfeld, Andreas
Scholze, Frank
Bär, Markus
description The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.
doi_str_mv 10.1364/OL.37.005229
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1323229260</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1273415890</sourcerecordid><originalsourceid>FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</originalsourceid><addsrcrecordid>eNqFkb1PwzAUxC0EoqWwMSOPDKT4I3HiEVV8VIrUBebIdp5LUBIX26nof09KCyvTSU-_d9LdIXRNyZxykd6vyjnP54RkjMkTNKUZl0may_QUTQlNRSIzySboIoQPQojIOT9HE8ZZVhBBp2i97DbebaHGa69i06-xB-P6EP1gYuN6rHe4hgi-a3r1c3AWt00P2Lth_d5DCLjpMXxFDx3goY1ebRvXQsTBqDg-ug6i312iM6vaAFdHnaG3p8fXxUtSrp6Xi4cyMVzkMRGGMMjq1BbUgCZFzq0RBecUqE4Lra2kbAQ1ZdqClSrT0hRCMaIzVhfM8hm6PfiOqT4HCLHqmmCgbVUPbggV5WN2Jpkg_6Ms5ynNCrlH7w6o8S4ED7ba-KZTfldRUu1XqFZlxfPqsMKI3xydB91B_Qf_1s6_ASdrhIc</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1273415890</pqid></control><display><type>article</type><title>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</title><source>OSA_美国光学学会数据库1</source><creator>Henn, Mark-Alexander ; Heidenreich, Sebastian ; Gross, Hermann ; Rathsfeld, Andreas ; Scholze, Frank ; Bär, Markus</creator><creatorcontrib>Henn, Mark-Alexander ; Heidenreich, Sebastian ; Gross, Hermann ; Rathsfeld, Andreas ; Scholze, Frank ; Bär, Markus</creatorcontrib><description>The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.</description><identifier>ISSN: 0146-9592</identifier><identifier>EISSN: 1539-4794</identifier><identifier>DOI: 10.1364/OL.37.005229</identifier><identifier>PMID: 23258061</identifier><language>eng</language><publisher>United States</publisher><subject>Diffraction gratings ; Gratings (spectra) ; Inverse method ; Mathematical analysis ; Mathematical models ; Reconstruction ; Roughness ; Ultraviolet</subject><ispartof>Optics letters, 2012-12, Vol.37 (24), p.5229-5231</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</citedby><cites>FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,3258,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23258061$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Henn, Mark-Alexander</creatorcontrib><creatorcontrib>Heidenreich, Sebastian</creatorcontrib><creatorcontrib>Gross, Hermann</creatorcontrib><creatorcontrib>Rathsfeld, Andreas</creatorcontrib><creatorcontrib>Scholze, Frank</creatorcontrib><creatorcontrib>Bär, Markus</creatorcontrib><title>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</title><title>Optics letters</title><addtitle>Opt Lett</addtitle><description>The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.</description><subject>Diffraction gratings</subject><subject>Gratings (spectra)</subject><subject>Inverse method</subject><subject>Mathematical analysis</subject><subject>Mathematical models</subject><subject>Reconstruction</subject><subject>Roughness</subject><subject>Ultraviolet</subject><issn>0146-9592</issn><issn>1539-4794</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqFkb1PwzAUxC0EoqWwMSOPDKT4I3HiEVV8VIrUBebIdp5LUBIX26nof09KCyvTSU-_d9LdIXRNyZxykd6vyjnP54RkjMkTNKUZl0may_QUTQlNRSIzySboIoQPQojIOT9HE8ZZVhBBp2i97DbebaHGa69i06-xB-P6EP1gYuN6rHe4hgi-a3r1c3AWt00P2Lth_d5DCLjpMXxFDx3goY1ebRvXQsTBqDg-ug6i312iM6vaAFdHnaG3p8fXxUtSrp6Xi4cyMVzkMRGGMMjq1BbUgCZFzq0RBecUqE4Lra2kbAQ1ZdqClSrT0hRCMaIzVhfM8hm6PfiOqT4HCLHqmmCgbVUPbggV5WN2Jpkg_6Ms5ynNCrlH7w6o8S4ED7ba-KZTfldRUu1XqFZlxfPqsMKI3xydB91B_Qf_1s6_ASdrhIc</recordid><startdate>20121215</startdate><enddate>20121215</enddate><creator>Henn, Mark-Alexander</creator><creator>Heidenreich, Sebastian</creator><creator>Gross, Hermann</creator><creator>Rathsfeld, Andreas</creator><creator>Scholze, Frank</creator><creator>Bär, Markus</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20121215</creationdate><title>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</title><author>Henn, Mark-Alexander ; Heidenreich, Sebastian ; Gross, Hermann ; Rathsfeld, Andreas ; Scholze, Frank ; Bär, Markus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Diffraction gratings</topic><topic>Gratings (spectra)</topic><topic>Inverse method</topic><topic>Mathematical analysis</topic><topic>Mathematical models</topic><topic>Reconstruction</topic><topic>Roughness</topic><topic>Ultraviolet</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Henn, Mark-Alexander</creatorcontrib><creatorcontrib>Heidenreich, Sebastian</creatorcontrib><creatorcontrib>Gross, Hermann</creatorcontrib><creatorcontrib>Rathsfeld, Andreas</creatorcontrib><creatorcontrib>Scholze, Frank</creatorcontrib><creatorcontrib>Bär, Markus</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Optics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Henn, Mark-Alexander</au><au>Heidenreich, Sebastian</au><au>Gross, Hermann</au><au>Rathsfeld, Andreas</au><au>Scholze, Frank</au><au>Bär, Markus</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2012-12-15</date><risdate>2012</risdate><volume>37</volume><issue>24</issue><spage>5229</spage><epage>5231</epage><pages>5229-5231</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><abstract>The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.</abstract><cop>United States</cop><pmid>23258061</pmid><doi>10.1364/OL.37.005229</doi><tpages>3</tpages></addata></record>
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source OSA_美国光学学会数据库1
subjects Diffraction gratings
Gratings (spectra)
Inverse method
Mathematical analysis
Mathematical models
Reconstruction
Roughness
Ultraviolet
title Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-23T05%3A48%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Improved%20grating%20reconstruction%20by%20determination%20of%20line%20roughness%20in%20extreme%20ultraviolet%20scatterometry&rft.jtitle=Optics%20letters&rft.au=Henn,%20Mark-Alexander&rft.date=2012-12-15&rft.volume=37&rft.issue=24&rft.spage=5229&rft.epage=5231&rft.pages=5229-5231&rft.issn=0146-9592&rft.eissn=1539-4794&rft_id=info:doi/10.1364/OL.37.005229&rft_dat=%3Cproquest_cross%3E1273415890%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1273415890&rft_id=info:pmid/23258061&rfr_iscdi=true