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Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry
The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile par...
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Published in: | Optics letters 2012-12, Vol.37 (24), p.5229-5231 |
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creator | Henn, Mark-Alexander Heidenreich, Sebastian Gross, Hermann Rathsfeld, Andreas Scholze, Frank Bär, Markus |
description | The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements. |
doi_str_mv | 10.1364/OL.37.005229 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1323229260</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1273415890</sourcerecordid><originalsourceid>FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</originalsourceid><addsrcrecordid>eNqFkb1PwzAUxC0EoqWwMSOPDKT4I3HiEVV8VIrUBebIdp5LUBIX26nof09KCyvTSU-_d9LdIXRNyZxykd6vyjnP54RkjMkTNKUZl0may_QUTQlNRSIzySboIoQPQojIOT9HE8ZZVhBBp2i97DbebaHGa69i06-xB-P6EP1gYuN6rHe4hgi-a3r1c3AWt00P2Lth_d5DCLjpMXxFDx3goY1ebRvXQsTBqDg-ug6i312iM6vaAFdHnaG3p8fXxUtSrp6Xi4cyMVzkMRGGMMjq1BbUgCZFzq0RBecUqE4Lra2kbAQ1ZdqClSrT0hRCMaIzVhfM8hm6PfiOqT4HCLHqmmCgbVUPbggV5WN2Jpkg_6Ms5ynNCrlH7w6o8S4ED7ba-KZTfldRUu1XqFZlxfPqsMKI3xydB91B_Qf_1s6_ASdrhIc</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1273415890</pqid></control><display><type>article</type><title>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</title><source>OSA_美国光学学会数据库1</source><creator>Henn, Mark-Alexander ; Heidenreich, Sebastian ; Gross, Hermann ; Rathsfeld, Andreas ; Scholze, Frank ; Bär, Markus</creator><creatorcontrib>Henn, Mark-Alexander ; Heidenreich, Sebastian ; Gross, Hermann ; Rathsfeld, Andreas ; Scholze, Frank ; Bär, Markus</creatorcontrib><description>The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.</description><identifier>ISSN: 0146-9592</identifier><identifier>EISSN: 1539-4794</identifier><identifier>DOI: 10.1364/OL.37.005229</identifier><identifier>PMID: 23258061</identifier><language>eng</language><publisher>United States</publisher><subject>Diffraction gratings ; Gratings (spectra) ; Inverse method ; Mathematical analysis ; Mathematical models ; Reconstruction ; Roughness ; Ultraviolet</subject><ispartof>Optics letters, 2012-12, Vol.37 (24), p.5229-5231</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</citedby><cites>FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,3258,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23258061$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Henn, Mark-Alexander</creatorcontrib><creatorcontrib>Heidenreich, Sebastian</creatorcontrib><creatorcontrib>Gross, Hermann</creatorcontrib><creatorcontrib>Rathsfeld, Andreas</creatorcontrib><creatorcontrib>Scholze, Frank</creatorcontrib><creatorcontrib>Bär, Markus</creatorcontrib><title>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</title><title>Optics letters</title><addtitle>Opt Lett</addtitle><description>The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.</description><subject>Diffraction gratings</subject><subject>Gratings (spectra)</subject><subject>Inverse method</subject><subject>Mathematical analysis</subject><subject>Mathematical models</subject><subject>Reconstruction</subject><subject>Roughness</subject><subject>Ultraviolet</subject><issn>0146-9592</issn><issn>1539-4794</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqFkb1PwzAUxC0EoqWwMSOPDKT4I3HiEVV8VIrUBebIdp5LUBIX26nof09KCyvTSU-_d9LdIXRNyZxykd6vyjnP54RkjMkTNKUZl0may_QUTQlNRSIzySboIoQPQojIOT9HE8ZZVhBBp2i97DbebaHGa69i06-xB-P6EP1gYuN6rHe4hgi-a3r1c3AWt00P2Lth_d5DCLjpMXxFDx3goY1ebRvXQsTBqDg-ug6i312iM6vaAFdHnaG3p8fXxUtSrp6Xi4cyMVzkMRGGMMjq1BbUgCZFzq0RBecUqE4Lra2kbAQ1ZdqClSrT0hRCMaIzVhfM8hm6PfiOqT4HCLHqmmCgbVUPbggV5WN2Jpkg_6Ms5ynNCrlH7w6o8S4ED7ba-KZTfldRUu1XqFZlxfPqsMKI3xydB91B_Qf_1s6_ASdrhIc</recordid><startdate>20121215</startdate><enddate>20121215</enddate><creator>Henn, Mark-Alexander</creator><creator>Heidenreich, Sebastian</creator><creator>Gross, Hermann</creator><creator>Rathsfeld, Andreas</creator><creator>Scholze, Frank</creator><creator>Bär, Markus</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20121215</creationdate><title>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</title><author>Henn, Mark-Alexander ; Heidenreich, Sebastian ; Gross, Hermann ; Rathsfeld, Andreas ; Scholze, Frank ; Bär, Markus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Diffraction gratings</topic><topic>Gratings (spectra)</topic><topic>Inverse method</topic><topic>Mathematical analysis</topic><topic>Mathematical models</topic><topic>Reconstruction</topic><topic>Roughness</topic><topic>Ultraviolet</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Henn, Mark-Alexander</creatorcontrib><creatorcontrib>Heidenreich, Sebastian</creatorcontrib><creatorcontrib>Gross, Hermann</creatorcontrib><creatorcontrib>Rathsfeld, Andreas</creatorcontrib><creatorcontrib>Scholze, Frank</creatorcontrib><creatorcontrib>Bär, Markus</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Optics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Henn, Mark-Alexander</au><au>Heidenreich, Sebastian</au><au>Gross, Hermann</au><au>Rathsfeld, Andreas</au><au>Scholze, Frank</au><au>Bär, Markus</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2012-12-15</date><risdate>2012</risdate><volume>37</volume><issue>24</issue><spage>5229</spage><epage>5231</epage><pages>5229-5231</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><abstract>The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile parameters that are obtained from scattered light intensities using inverse methods. We illustrate the effect of line roughness on the reconstruction of grating parameters employing a maximum likelihood scheme. Neglecting line roughness introduces a strong bias in the parameter estimations. Therefore, such roughness has to be included in the mathematical model of the measurement in order to obtain accurate reconstruction results. In addition, the method allows to determine line roughness from scatterometry. The approach is demonstrated for simulated scattering intensities as well as for experimental data of extreme ultraviolet light scatterometry measurements. The results obtained from the experimental data are in agreement with independent atomic force microscopy measurements.</abstract><cop>United States</cop><pmid>23258061</pmid><doi>10.1364/OL.37.005229</doi><tpages>3</tpages></addata></record> |
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source | OSA_美国光学学会数据库1 |
subjects | Diffraction gratings Gratings (spectra) Inverse method Mathematical analysis Mathematical models Reconstruction Roughness Ultraviolet |
title | Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-23T05%3A48%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Improved%20grating%20reconstruction%20by%20determination%20of%20line%20roughness%20in%20extreme%20ultraviolet%20scatterometry&rft.jtitle=Optics%20letters&rft.au=Henn,%20Mark-Alexander&rft.date=2012-12-15&rft.volume=37&rft.issue=24&rft.spage=5229&rft.epage=5231&rft.pages=5229-5231&rft.issn=0146-9592&rft.eissn=1539-4794&rft_id=info:doi/10.1364/OL.37.005229&rft_dat=%3Cproquest_cross%3E1273415890%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c367t-6c02e5d4f81ceb0873fc68331e1b48bbf912367b12bfef9a5b9c86a20b52d82f3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1273415890&rft_id=info:pmid/23258061&rfr_iscdi=true |