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Degradation of profenofos in an electrochemical flow reactor using boron-doped diamond anodes
A study of the electrochemical degradation of profenofos in a flow reactor with electrodes comprising boron-doped diamond films deposited on titanium substrate (BDD/Ti) as anodes has been performed. The BDD films were produced at growth times of 7 and 24h with similar B/C ratios corresponding to acc...
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Published in: | Diamond and related materials 2013-02, Vol.32, p.54-60 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A study of the electrochemical degradation of profenofos in a flow reactor with electrodes comprising boron-doped diamond films deposited on titanium substrate (BDD/Ti) as anodes has been performed. The BDD films were produced at growth times of 7 and 24h with similar B/C ratios corresponding to acceptor concentrations of around 1020atomscm−3. The morphological and structural characteristics of the BDD/Ti electrodes were evaluated by scanning electron microscopy and Raman scattering spectroscopy. Degradation experiments were carried out with applied current densities in the range 10 to 200mAcm−2 and flow rates of 50 and 300Lh−1. The rates of degradation of profenofos were evaluated by high performance liquid chromatography and variations in total organic carbon (TOC) were monitored during the electrochemical process in order to determine the level of mineralization of organic compounds present in the electrolyte. Under the best conditions (anode comprising a BDD film deposited on titanium for 7h and reactor operating at a flow rate of 300Lh−1) more than 95% of the profenofos was degraded and approximately 87% of TOC was removed within 120min of reaction time.
► Electrochemical degradation of profenofos using boron-doped diamond electrodes ► Influence of the diamond morphology in the profenofos degradation ► Systematic HPLC analysis of the profenofos degradation to optimize the process |
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ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/j.diamond.2012.11.008 |