Dual Patterning of a Poly(acrylic acid) Layer by Electron-Beam and Block Copolymer Lithographies

We show the controllable patterning of palladium nanoparticles in both one and two dimensions using electron-beam lithography and reactive ion etching of a thin film of poly(acrylic acid) (PAA). After the initial patterning of the PAA, a monolayer of polystyrene-b-poly-2-vinylpyridine micelles is sp...

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Bibliographic Details
Published in:Langmuir 2013-06, Vol.29 (24), p.7433-7438
Main Authors: Pearson, Anthony C, Linford, Matthew R, Harb, John N, Davis, Robert C
Format: Article
Language:English
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Summary:We show the controllable patterning of palladium nanoparticles in both one and two dimensions using electron-beam lithography and reactive ion etching of a thin film of poly(acrylic acid) (PAA). After the initial patterning of the PAA, a monolayer of polystyrene-b-poly-2-vinylpyridine micelles is spun cast onto the surface. A short reactive ion etch is then used to transfer the micelle pattern into the patterned poly(acrylic acid) . Finally, PdCl2 is loaded from solution into the patterned poly(acrylic acid) features, and a reactive-ion etching process is used to remove the remaining polymer and form Pd nanoparticles. This method yields location-controlled patches of nanoparticles, including single- and double-file lines and nanoparticle pairs. A locational accuracy of 9 nm or less in one direction was achieved by optimizing the size of the PAA features.
ISSN:0743-7463
1520-5827
DOI:10.1021/la304486x