Disorder-driven metal-insulator-transition assisted by interband Coulomb repulsion in a surface transfer doped electron system

The two-dimensional conducting properties of the Si(111) ... x ... surface doped by the charge surface transfer mechanism have been calculated in the frame of a semiclassical Drude-Boltzmann model considering donor scattering mechanisms. To perform these calculations, the required values of the carr...

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Bibliographic Details
Published in:Europhysics letters 2012-12, Vol.100 (5), p.1-1
Main Author: Sánchez-Royo, Juan Francisco
Format: Article
Language:English
Subjects:
Carriers
Charge
Conduction
Disorders
Doping
Mathematical models
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Summary:The two-dimensional conducting properties of the Si(111) ... x ... surface doped by the charge surface transfer mechanism have been calculated in the frame of a semiclassical Drude-Boltzmann model considering donor scattering mechanisms. To perform these calculations, the required values of the carrier effective mass were extracted from reported angle-resolved photoemission results. The calculated doping dependence of the surface conductance reproduces experimental results reported and reveals an intricate metallization process driven by disorder and assisted by interband interactions. The system should behave as an insulator even at relatively low doping due to disorder. However, when doping increases, the system achieves to attenuate the inherent localization effects introduced by disorder and to conduct by percolation. The mechanism found by the system to conduct appears to be connected with the increasing of the carrier effective mass observed with doping, which seems to be caused by interband interactions involving the conducting band and deeper ones. (ProQuest: ... denotes formulae/symbols omitted.)
ISSN:0295-5075
1286-4854