Mass Spectrometric Characterizations of Ions Generated in RF Magnetron Discharges during Sputtering of Silver in Ne, Ar, Kr an.d Xe Gases

The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg)+, X2+, Ag2+, X++ and...

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Bibliographic Details
Published in:Plasma processes and polymers 2013-07, Vol.10 (7), p.593-602
Main Authors: Pokorný, Petr, Novotný, Michal, Musil, Jindřich, Fitl, Přemysl, Bulíř, Jiří, Lančok, Ján
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
double charge ions
Energy distribution
Exact sciences and technology
Gas pressure
Gases
Ion energy distribution
Magnetic properties
mass spectrometry
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
noble gas
Physics
Radio frequencies
RF magnetron discharges
Silver
single charge ions
Spectroscopy
Sputtering
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Summary:The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg)+, X2+, Ag2+, X++ and Ag++ were found in the RF discharges; here X = Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges. The physical properties of noble gases strongly influence the yield of atoms sputtered from a magnetron target, as well as the kinds of ions generated in the RF discharges. The amount of individual ions, their energies and ion energy distribution functions are studied here as a function of the sputtering gas and their pressure.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201200145