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Optimal sample preparation for nanoparticle metrology (statistical size measurements) using atomic force microscopy

Optimal deposition procedures are determined for nanoparticle size characterization by atomic force microscopy (AFM). Accurate nanoparticle size distribution analysis with AFM requires non-agglomerated nanoparticles on a flat substrate. The deposition of polystyrene (100 nm), silica (300 and 100 nm)...

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Bibliographic Details
Published in:Journal of nanoparticle research : an interdisciplinary forum for nanoscale science and technology 2010-03, Vol.12 (3), p.939-949
Main Authors: Hoo, Christopher M., Doan, Trang, Starostin, Natasha, West, Paul E., Mecartney, Martha L.
Format: Article
Language:English
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Summary:Optimal deposition procedures are determined for nanoparticle size characterization by atomic force microscopy (AFM). Accurate nanoparticle size distribution analysis with AFM requires non-agglomerated nanoparticles on a flat substrate. The deposition of polystyrene (100 nm), silica (300 and 100 nm), gold (100 nm), and CdSe quantum dot (2–5 nm) nanoparticles by spin coating was optimized for size distribution measurements by AFM. Factors influencing deposition include spin speed, concentration, solvent, and pH. A comparison using spin coating, static evaporation, and a new fluid cell deposition method for depositing nanoparticles is also made. The fluid cell allows for a more uniform and higher density deposition of nanoparticles on a substrate at laminar flow rates, making nanoparticle size analysis via AFM more efficient and also offers the potential for nanoparticle analysis in liquid environments.
ISSN:1388-0764
1572-896X
DOI:10.1007/s11051-009-9644-8