Loading…
Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques
Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic‐inorganic thin films. MLD allows for the growth of ultrathin and conformal films using sequential, self‐limiting reactions. This article focuses on the MLD of hybrid organic‐inorganic films grown using metal precur...
Saved in:
Published in: | Advanced functional materials 2013-02, Vol.23 (5), p.532-546 |
---|---|
Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743 |
---|---|
cites | cdi_FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743 |
container_end_page | 546 |
container_issue | 5 |
container_start_page | 532 |
container_title | Advanced functional materials |
container_volume | 23 |
creator | Lee, Byoung H. Yoon, Byunghoon Abdulagatov, Aziz I. Hall, Robert A. George, Steven M. |
description | Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic‐inorganic thin films. MLD allows for the growth of ultrathin and conformal films using sequential, self‐limiting reactions. This article focuses on the MLD of hybrid organic‐inorganic films grown using metal precursors and various organic alcohols that yield metal alkoxide films. This family of metal alkoxides can be described as “metalcones”. Many metalcones are possible, such as the “alucones” and “zincones” based on the reaction of trimethylaluminum and diethylzinc, respectively, with various organic diols such as ethylene glycol. Alloys of the various metalcones with their parent metal oxide atomic layer deposition (ALD) films can also be fabricated that have an organic‐inorganic composition that can be adjusted by controlling the relative number of ALD and MLD cycles. These metalcone alloys have tunable chemical, optical, mechanical, and electrical properties that may be useful for designing various functional films. The metalcone hybrid organic‐inorganic materials offer a new tool set for engineering thin film properties.
Hybrid organic‐inorganic films can be grown using molecular layer deposition (MLD) techniques. MLD utilizes sequential, self‐limiting reactions to deposit conformal films with atomic level control. Metal alkoxide films known as “metalcones” can be fabricated using metal precursors and organic alcohols. The functional properties of metalcone films can be tuned by varying the relative fraction of their organic and inorganic constituents. |
doi_str_mv | 10.1002/adfm.201200370 |
format | article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1439757897</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1439757897</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743</originalsourceid><addsrcrecordid>eNqFkDtv2zAUhYUgBeKkXTNz7CL38iVaY2LXD8CPDDGajaCpS4eNJLqkjNT_vjFUGN063TN837nAybJ7CkMKwL6ZyjVDBpQBcAVX2YAWtMg5sNH1JdOXm-w2pZ8AVCkuBlkzi-G9eyWmrchTDAeMncdEgiPz0y76imzi3rTe5os29ImssDO1DS2Sqa-bRLbJt3uyCjXaY20iWZoTRjLBQ0i-86Elz2hfW__riOlz9smZOuGXv_cu206_P4_n-XIzW4wflrkVAJAbYFAJiWJXSYtCGsFdyQpLHS9wxylTCoyRUjm3QykY50UhR6UEg6icEvwu-9r3HmI4_-1045PFujYthmPSVPBSSTUq1Qc67FEbQ0oRnT5E35h40hT0eVd93lVfdv0Qyl549zWe_kPrh8l09a-b965PHf6-uCa-6UJxJfWP9UzPx2s2Wj2t9SP_A8fgjE4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1439757897</pqid></control><display><type>article</type><title>Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques</title><source>Wiley-Blackwell Read & Publish Collection</source><creator>Lee, Byoung H. ; Yoon, Byunghoon ; Abdulagatov, Aziz I. ; Hall, Robert A. ; George, Steven M.</creator><creatorcontrib>Lee, Byoung H. ; Yoon, Byunghoon ; Abdulagatov, Aziz I. ; Hall, Robert A. ; George, Steven M.</creatorcontrib><description>Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic‐inorganic thin films. MLD allows for the growth of ultrathin and conformal films using sequential, self‐limiting reactions. This article focuses on the MLD of hybrid organic‐inorganic films grown using metal precursors and various organic alcohols that yield metal alkoxide films. This family of metal alkoxides can be described as “metalcones”. Many metalcones are possible, such as the “alucones” and “zincones” based on the reaction of trimethylaluminum and diethylzinc, respectively, with various organic diols such as ethylene glycol. Alloys of the various metalcones with their parent metal oxide atomic layer deposition (ALD) films can also be fabricated that have an organic‐inorganic composition that can be adjusted by controlling the relative number of ALD and MLD cycles. These metalcone alloys have tunable chemical, optical, mechanical, and electrical properties that may be useful for designing various functional films. The metalcone hybrid organic‐inorganic materials offer a new tool set for engineering thin film properties.
Hybrid organic‐inorganic films can be grown using molecular layer deposition (MLD) techniques. MLD utilizes sequential, self‐limiting reactions to deposit conformal films with atomic level control. Metal alkoxide films known as “metalcones” can be fabricated using metal precursors and organic alcohols. The functional properties of metalcone films can be tuned by varying the relative fraction of their organic and inorganic constituents.</description><identifier>ISSN: 1616-301X</identifier><identifier>EISSN: 1616-3028</identifier><identifier>DOI: 10.1002/adfm.201200370</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Alcohols ; Alkoxides ; Alloys ; atomic layer deposition ; Deposition ; Electrical properties ; functional properties ; hybrid films ; molecular layer deposition ; organic-inorganic films ; Oxides ; Precursors ; Thin films</subject><ispartof>Advanced functional materials, 2013-02, Vol.23 (5), p.532-546</ispartof><rights>Copyright © 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743</citedby><cites>FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Lee, Byoung H.</creatorcontrib><creatorcontrib>Yoon, Byunghoon</creatorcontrib><creatorcontrib>Abdulagatov, Aziz I.</creatorcontrib><creatorcontrib>Hall, Robert A.</creatorcontrib><creatorcontrib>George, Steven M.</creatorcontrib><title>Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques</title><title>Advanced functional materials</title><addtitle>Adv. Funct. Mater</addtitle><description>Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic‐inorganic thin films. MLD allows for the growth of ultrathin and conformal films using sequential, self‐limiting reactions. This article focuses on the MLD of hybrid organic‐inorganic films grown using metal precursors and various organic alcohols that yield metal alkoxide films. This family of metal alkoxides can be described as “metalcones”. Many metalcones are possible, such as the “alucones” and “zincones” based on the reaction of trimethylaluminum and diethylzinc, respectively, with various organic diols such as ethylene glycol. Alloys of the various metalcones with their parent metal oxide atomic layer deposition (ALD) films can also be fabricated that have an organic‐inorganic composition that can be adjusted by controlling the relative number of ALD and MLD cycles. These metalcone alloys have tunable chemical, optical, mechanical, and electrical properties that may be useful for designing various functional films. The metalcone hybrid organic‐inorganic materials offer a new tool set for engineering thin film properties.
Hybrid organic‐inorganic films can be grown using molecular layer deposition (MLD) techniques. MLD utilizes sequential, self‐limiting reactions to deposit conformal films with atomic level control. Metal alkoxide films known as “metalcones” can be fabricated using metal precursors and organic alcohols. The functional properties of metalcone films can be tuned by varying the relative fraction of their organic and inorganic constituents.</description><subject>Alcohols</subject><subject>Alkoxides</subject><subject>Alloys</subject><subject>atomic layer deposition</subject><subject>Deposition</subject><subject>Electrical properties</subject><subject>functional properties</subject><subject>hybrid films</subject><subject>molecular layer deposition</subject><subject>organic-inorganic films</subject><subject>Oxides</subject><subject>Precursors</subject><subject>Thin films</subject><issn>1616-301X</issn><issn>1616-3028</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqFkDtv2zAUhYUgBeKkXTNz7CL38iVaY2LXD8CPDDGajaCpS4eNJLqkjNT_vjFUGN063TN837nAybJ7CkMKwL6ZyjVDBpQBcAVX2YAWtMg5sNH1JdOXm-w2pZ8AVCkuBlkzi-G9eyWmrchTDAeMncdEgiPz0y76imzi3rTe5os29ImssDO1DS2Sqa-bRLbJt3uyCjXaY20iWZoTRjLBQ0i-86Elz2hfW__riOlz9smZOuGXv_cu206_P4_n-XIzW4wflrkVAJAbYFAJiWJXSYtCGsFdyQpLHS9wxylTCoyRUjm3QykY50UhR6UEg6icEvwu-9r3HmI4_-1045PFujYthmPSVPBSSTUq1Qc67FEbQ0oRnT5E35h40hT0eVd93lVfdv0Qyl549zWe_kPrh8l09a-b965PHf6-uCa-6UJxJfWP9UzPx2s2Wj2t9SP_A8fgjE4</recordid><startdate>20130205</startdate><enddate>20130205</enddate><creator>Lee, Byoung H.</creator><creator>Yoon, Byunghoon</creator><creator>Abdulagatov, Aziz I.</creator><creator>Hall, Robert A.</creator><creator>George, Steven M.</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130205</creationdate><title>Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques</title><author>Lee, Byoung H. ; Yoon, Byunghoon ; Abdulagatov, Aziz I. ; Hall, Robert A. ; George, Steven M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Alcohols</topic><topic>Alkoxides</topic><topic>Alloys</topic><topic>atomic layer deposition</topic><topic>Deposition</topic><topic>Electrical properties</topic><topic>functional properties</topic><topic>hybrid films</topic><topic>molecular layer deposition</topic><topic>organic-inorganic films</topic><topic>Oxides</topic><topic>Precursors</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lee, Byoung H.</creatorcontrib><creatorcontrib>Yoon, Byunghoon</creatorcontrib><creatorcontrib>Abdulagatov, Aziz I.</creatorcontrib><creatorcontrib>Hall, Robert A.</creatorcontrib><creatorcontrib>George, Steven M.</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Advanced functional materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lee, Byoung H.</au><au>Yoon, Byunghoon</au><au>Abdulagatov, Aziz I.</au><au>Hall, Robert A.</au><au>George, Steven M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques</atitle><jtitle>Advanced functional materials</jtitle><addtitle>Adv. Funct. Mater</addtitle><date>2013-02-05</date><risdate>2013</risdate><volume>23</volume><issue>5</issue><spage>532</spage><epage>546</epage><pages>532-546</pages><issn>1616-301X</issn><eissn>1616-3028</eissn><abstract>Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic‐inorganic thin films. MLD allows for the growth of ultrathin and conformal films using sequential, self‐limiting reactions. This article focuses on the MLD of hybrid organic‐inorganic films grown using metal precursors and various organic alcohols that yield metal alkoxide films. This family of metal alkoxides can be described as “metalcones”. Many metalcones are possible, such as the “alucones” and “zincones” based on the reaction of trimethylaluminum and diethylzinc, respectively, with various organic diols such as ethylene glycol. Alloys of the various metalcones with their parent metal oxide atomic layer deposition (ALD) films can also be fabricated that have an organic‐inorganic composition that can be adjusted by controlling the relative number of ALD and MLD cycles. These metalcone alloys have tunable chemical, optical, mechanical, and electrical properties that may be useful for designing various functional films. The metalcone hybrid organic‐inorganic materials offer a new tool set for engineering thin film properties.
Hybrid organic‐inorganic films can be grown using molecular layer deposition (MLD) techniques. MLD utilizes sequential, self‐limiting reactions to deposit conformal films with atomic level control. Metal alkoxide films known as “metalcones” can be fabricated using metal precursors and organic alcohols. The functional properties of metalcone films can be tuned by varying the relative fraction of their organic and inorganic constituents.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/adfm.201200370</doi><tpages>15</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1616-301X |
ispartof | Advanced functional materials, 2013-02, Vol.23 (5), p.532-546 |
issn | 1616-301X 1616-3028 |
language | eng |
recordid | cdi_proquest_miscellaneous_1439757897 |
source | Wiley-Blackwell Read & Publish Collection |
subjects | Alcohols Alkoxides Alloys atomic layer deposition Deposition Electrical properties functional properties hybrid films molecular layer deposition organic-inorganic films Oxides Precursors Thin films |
title | Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T23%3A36%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Growth%20and%20Properties%20of%20Hybrid%20Organic-Inorganic%20Metalcone%20Films%20Using%20Molecular%20Layer%20Deposition%20Techniques&rft.jtitle=Advanced%20functional%20materials&rft.au=Lee,%20Byoung%20H.&rft.date=2013-02-05&rft.volume=23&rft.issue=5&rft.spage=532&rft.epage=546&rft.pages=532-546&rft.issn=1616-301X&rft.eissn=1616-3028&rft_id=info:doi/10.1002/adfm.201200370&rft_dat=%3Cproquest_cross%3E1439757897%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c4000-a020d45e4bd5ce45a43f926c1f36eb312770aa557ffbe542336658950aee7f743%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1439757897&rft_id=info:pmid/&rfr_iscdi=true |