Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films

Fast and reproducible patterning of high‐resolution rGO microstructures over a large area directly on various substrates by modulating the surface energy is reported. The pattern formation of rGO thin films is based on the difference in the adhesion strength between the mold/rGO and rGO/substrates i...

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Published in:Advanced materials (Weinheim) 2013-02, Vol.25 (6), p.894-898
Main Authors: Kim, Nam Hee, Kim, Beom Jun, Ko, Yeongun, Cho, Jeong Ho, Chang, Suk Tai
Format: Article
Language:English
Subjects:
Adhesive strength
Electrodes
Graphene
Graphite - chemistry
micropatterning
Molds
OFETs
Oxides
Oxides - chemistry
Patterning
reduced graphene oxide
Semiconductors
Solutions - chemistry
Surface energy
Thermodynamics
Thin films
work of adhesion
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cited_by cdi_FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33
cites cdi_FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33
container_end_page 898
container_issue 6
container_start_page 894
container_title Advanced materials (Weinheim)
container_volume 25
creator Kim, Nam Hee
Kim, Beom Jun
Ko, Yeongun
Cho, Jeong Ho
Chang, Suk Tai
description Fast and reproducible patterning of high‐resolution rGO microstructures over a large area directly on various substrates by modulating the surface energy is reported. The pattern formation of rGO thin films is based on the difference in the adhesion strength between the mold/rGO and rGO/substrates interfaces. Such highly defined rGO micropatterns are applied as electrodes for high‐performance flexible and transparent OFETs.
doi_str_mv 10.1002/adma.201203881
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1439767720</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1285462392</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33</originalsourceid><addsrcrecordid>eNqFkUtPGzEUha2qVUmBbZfVLLvopH7PeBkRGCpBKRDK0nLs68TtPII9o5J_30FJo-5YncX9vrO4B6GPBE8JxvSrcY2ZUkwoZmVJ3qAJEZTkHCvxFk2wYiJXkpdH6ENKvzDGSmL5Hh1RRqgghE1QvB-iNxay8xbiajvGKrQAEdyX7DKs1vkdpK4e-tC12XWwsduYvofYhnaVdT6739_yH7GzkBK47A7cYMesotmsoYXs5jk4yBbr0GYXoW7SCXrnTZ3gdJ_H6OHifHF2mV_dVN_OZle55UKSfMk5KYUvQXqlfAGMuNIa7hz3BTWOGGI5U8YSYUSBmSQKc7s0VmAnvDGMHaPPu95N7J4GSL1uQrJQ16aFbkiajHohi2J83asoLQWXlCk6otMdOv4ipQheb2JoTNxqgvXLJPplEn2YZBQ-7buHZQPugP_bYATUDvgTati-Uqdn8-vZ_-X5zg2ph-eDa-JvLQtWCP34vdK3VTWf_xQL_cj-AtGkqA0</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1285462392</pqid></control><display><type>article</type><title>Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films</title><source>Wiley:Jisc Collections:Wiley Read and Publish Open Access 2024-2025 (reading list)</source><creator>Kim, Nam Hee ; Kim, Beom Jun ; Ko, Yeongun ; Cho, Jeong Ho ; Chang, Suk Tai</creator><creatorcontrib>Kim, Nam Hee ; Kim, Beom Jun ; Ko, Yeongun ; Cho, Jeong Ho ; Chang, Suk Tai</creatorcontrib><description>Fast and reproducible patterning of high‐resolution rGO microstructures over a large area directly on various substrates by modulating the surface energy is reported. The pattern formation of rGO thin films is based on the difference in the adhesion strength between the mold/rGO and rGO/substrates interfaces. Such highly defined rGO micropatterns are applied as electrodes for high‐performance flexible and transparent OFETs.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.201203881</identifier><identifier>PMID: 23125113</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Adhesive strength ; Electrodes ; Graphene ; Graphite - chemistry ; micropatterning ; Molds ; OFETs ; Oxides ; Oxides - chemistry ; Patterning ; reduced graphene oxide ; Semiconductors ; Solutions - chemistry ; Surface energy ; Thermodynamics ; Thin films ; work of adhesion</subject><ispartof>Advanced materials (Weinheim), 2013-02, Vol.25 (6), p.894-898</ispartof><rights>Copyright © 2013 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33</citedby><cites>FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27922,27923</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23125113$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Kim, Nam Hee</creatorcontrib><creatorcontrib>Kim, Beom Jun</creatorcontrib><creatorcontrib>Ko, Yeongun</creatorcontrib><creatorcontrib>Cho, Jeong Ho</creatorcontrib><creatorcontrib>Chang, Suk Tai</creatorcontrib><title>Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films</title><title>Advanced materials (Weinheim)</title><addtitle>Adv. Mater</addtitle><description>Fast and reproducible patterning of high‐resolution rGO microstructures over a large area directly on various substrates by modulating the surface energy is reported. The pattern formation of rGO thin films is based on the difference in the adhesion strength between the mold/rGO and rGO/substrates interfaces. Such highly defined rGO micropatterns are applied as electrodes for high‐performance flexible and transparent OFETs.</description><subject>Adhesive strength</subject><subject>Electrodes</subject><subject>Graphene</subject><subject>Graphite - chemistry</subject><subject>micropatterning</subject><subject>Molds</subject><subject>OFETs</subject><subject>Oxides</subject><subject>Oxides - chemistry</subject><subject>Patterning</subject><subject>reduced graphene oxide</subject><subject>Semiconductors</subject><subject>Solutions - chemistry</subject><subject>Surface energy</subject><subject>Thermodynamics</subject><subject>Thin films</subject><subject>work of adhesion</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqFkUtPGzEUha2qVUmBbZfVLLvopH7PeBkRGCpBKRDK0nLs68TtPII9o5J_30FJo-5YncX9vrO4B6GPBE8JxvSrcY2ZUkwoZmVJ3qAJEZTkHCvxFk2wYiJXkpdH6ENKvzDGSmL5Hh1RRqgghE1QvB-iNxay8xbiajvGKrQAEdyX7DKs1vkdpK4e-tC12XWwsduYvofYhnaVdT6739_yH7GzkBK47A7cYMesotmsoYXs5jk4yBbr0GYXoW7SCXrnTZ3gdJ_H6OHifHF2mV_dVN_OZle55UKSfMk5KYUvQXqlfAGMuNIa7hz3BTWOGGI5U8YSYUSBmSQKc7s0VmAnvDGMHaPPu95N7J4GSL1uQrJQ16aFbkiajHohi2J83asoLQWXlCk6otMdOv4ipQheb2JoTNxqgvXLJPplEn2YZBQ-7buHZQPugP_bYATUDvgTati-Uqdn8-vZ_-X5zg2ph-eDa-JvLQtWCP34vdK3VTWf_xQL_cj-AtGkqA0</recordid><startdate>20130213</startdate><enddate>20130213</enddate><creator>Kim, Nam Hee</creator><creator>Kim, Beom Jun</creator><creator>Ko, Yeongun</creator><creator>Cho, Jeong Ho</creator><creator>Chang, Suk Tai</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130213</creationdate><title>Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films</title><author>Kim, Nam Hee ; Kim, Beom Jun ; Ko, Yeongun ; Cho, Jeong Ho ; Chang, Suk Tai</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Adhesive strength</topic><topic>Electrodes</topic><topic>Graphene</topic><topic>Graphite - chemistry</topic><topic>micropatterning</topic><topic>Molds</topic><topic>OFETs</topic><topic>Oxides</topic><topic>Oxides - chemistry</topic><topic>Patterning</topic><topic>reduced graphene oxide</topic><topic>Semiconductors</topic><topic>Solutions - chemistry</topic><topic>Surface energy</topic><topic>Thermodynamics</topic><topic>Thin films</topic><topic>work of adhesion</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kim, Nam Hee</creatorcontrib><creatorcontrib>Kim, Beom Jun</creatorcontrib><creatorcontrib>Ko, Yeongun</creatorcontrib><creatorcontrib>Cho, Jeong Ho</creatorcontrib><creatorcontrib>Chang, Suk Tai</creatorcontrib><collection>Istex</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kim, Nam Hee</au><au>Kim, Beom Jun</au><au>Ko, Yeongun</au><au>Cho, Jeong Ho</au><au>Chang, Suk Tai</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films</atitle><jtitle>Advanced materials (Weinheim)</jtitle><addtitle>Adv. Mater</addtitle><date>2013-02-13</date><risdate>2013</risdate><volume>25</volume><issue>6</issue><spage>894</spage><epage>898</epage><pages>894-898</pages><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>Fast and reproducible patterning of high‐resolution rGO microstructures over a large area directly on various substrates by modulating the surface energy is reported. The pattern formation of rGO thin films is based on the difference in the adhesion strength between the mold/rGO and rGO/substrates interfaces. Such highly defined rGO micropatterns are applied as electrodes for high‐performance flexible and transparent OFETs.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><pmid>23125113</pmid><doi>10.1002/adma.201203881</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
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subjects Adhesive strength
Electrodes
Graphene
Graphite - chemistry
micropatterning
Molds
OFETs
Oxides
Oxides - chemistry
Patterning
reduced graphene oxide
Semiconductors
Solutions - chemistry
Surface energy
Thermodynamics
Thin films
work of adhesion
title Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T10%3A00%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Surface%20Energy%20Engineered,%20High-Resolution%20Micropatterning%20of%20Solution-Processed%20Reduced%20Graphene%20Oxide%20Thin%20Films&rft.jtitle=Advanced%20materials%20(Weinheim)&rft.au=Kim,%20Nam%20Hee&rft.date=2013-02-13&rft.volume=25&rft.issue=6&rft.spage=894&rft.epage=898&rft.pages=894-898&rft.issn=0935-9648&rft.eissn=1521-4095&rft_id=info:doi/10.1002/adma.201203881&rft_dat=%3Cproquest_cross%3E1285462392%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c4561-b44185f8e6f99f7e31d8ca4dd4f72ad1a1c439ac15a570361904cbac50d5faa33%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1285462392&rft_id=info:pmid/23125113&rfr_iscdi=true