A comparative study of dc biased RF impedance probes and Langmuir probes for the measurement of processing plasma parameters

In this work, we compare measurements of electron density (n sub(e)), plasma potential ( iota sub(p)), electron temperature (T sub(e)), and electron energy distribution function (EEDF or f(E)) made with a dc biased RF probe and a Langmuir probe. The measurements show good agreement between the two p...

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Bibliographic Details
Published in:Plasma sources science & technology 2012-02, Vol.21 (1), p.15011-1-6
Main Authors: BORIS, D. R, FERNSLER, R. F, WALTON, S. G
Format: Article
Language:English
Subjects:
Direct current
Electric and magnetic measurements
Electron density
Electron energy distribution
Electron temperature
Exact sciences and technology
Impedance probes
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma density
Plasma diagnostic techniques and instrumentation
Plasma potentials
Radio frequencies
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Summary:In this work, we compare measurements of electron density (n sub(e)), plasma potential ( iota sub(p)), electron temperature (T sub(e)), and electron energy distribution function (EEDF or f(E)) made with a dc biased RF probe and a Langmuir probe. The measurements show good agreement between the two probes across an order of magnitude in plasma density.
ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/21/1/015011