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Effect of annealing on properties of transparent conducting tin oxide films deposited by thermal evaporation

The surface morphology, structural characteristics and optical properties of the transparent conducting SnO(2) films deposited by vapour deposition of SnCl(2).2H(2)O on heated glass substrate have been evaluated by X-ray diffraction, scanning electron microscopy, EDAX analysis and spectro-photometri...

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Published in:Indian journal of pure & applied physics 2013-08, Vol.51 (8), p.558-562
Main Authors: Singh, Beer Pal, Kumar, Rakesh, Kumar, Ashwani, Gaur, Jyotshana, Singh, Sunder Pal, Tyagi, R C
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container_title Indian journal of pure & applied physics
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creator Singh, Beer Pal
Kumar, Rakesh
Kumar, Ashwani
Gaur, Jyotshana
Singh, Sunder Pal
Tyagi, R C
description The surface morphology, structural characteristics and optical properties of the transparent conducting SnO(2) films deposited by vapour deposition of SnCl(2).2H(2)O on heated glass substrate have been evaluated by X-ray diffraction, scanning electron microscopy, EDAX analysis and spectro-photometric examination. The 'as deposited' films of tin oxide were found to be polycrystalline, adhesive and pin hole free. After annealing at a higher temperature, these films exhibited an improved crystalline surface morphology and also displayed random perforations having a dendrite structure. It is found that heat treatment of the 'as deposited' tin oxide films results in conversion of the SnO component into SnO(2) phase which resulted in a better transparency, larger crystallite size and reduced film thickness due to diffusion of tin into the matrix of the glass substrate thereby making the film more suitable for device applications. The increased porosity of 'annealed' films provides more surface area for use as sensors and also makes them less likely to fracture when used as high temperature electrodes.
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subjects Annealing
Conduction
Deposition
Devices
Electrodes
Glass
Morphology
Tin oxides
title Effect of annealing on properties of transparent conducting tin oxide films deposited by thermal evaporation
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