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Phase control of semi-polar (112¯2) and non-polar (112¯0) GaN on cone shaped r-plane patterned sapphire substrates

The control of formation of semi-polar (112¯2) and nonpolar a-plane (112¯0) GaN phases on r-plane cone shaped patterned sapphire substrates (CPSS) by metalorganic vapor-phase epitaxy has been investigated. With a nucleation layer grown at 535°C and 200mbar, only semi-polar (112¯2) GaN is formed. Inc...

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Bibliographic Details
Published in:Journal of crystal growth 2013-05, Vol.371, p.11-16
Main Authors: Wang, Mei-Tan, Brunner, Frank, Liao, Kuan-Yung, Li, Yun-Li, Tseng, Snow H., Weyers, Markus
Format: Article
Language:English
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Summary:The control of formation of semi-polar (112¯2) and nonpolar a-plane (112¯0) GaN phases on r-plane cone shaped patterned sapphire substrates (CPSS) by metalorganic vapor-phase epitaxy has been investigated. With a nucleation layer grown at 535°C and 200mbar, only semi-polar (112¯2) GaN is formed. Increasing the nucleation layer temperature to 965°C, only (112¯0) GaN is grown at 200mbar. At reduced reactor pressure of 60mbar, phase selectivity breaks down and semi-polar (112¯2) and non-polar (112¯0) GaN exist simultaneously. The crystalline quality of a-plane GaN on r-plane CPSS can be effectively improved using optimized growth direction control. ► Phase control of (112¯2) and (112¯0) GaN grown on r-plane CPSS is studied. ► Growth competition between (112¯2) and (112¯0) GaN is severely influenced by the nucleation temperature. ► Optimized completion of a-plane (112¯0) GaN enables a smooth surface on r-plane CPSS.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2013.01.032