Loading…
Phase control of semi-polar (112¯2) and non-polar (112¯0) GaN on cone shaped r-plane patterned sapphire substrates
The control of formation of semi-polar (112¯2) and nonpolar a-plane (112¯0) GaN phases on r-plane cone shaped patterned sapphire substrates (CPSS) by metalorganic vapor-phase epitaxy has been investigated. With a nucleation layer grown at 535°C and 200mbar, only semi-polar (112¯2) GaN is formed. Inc...
Saved in:
Published in: | Journal of crystal growth 2013-05, Vol.371, p.11-16 |
---|---|
Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | The control of formation of semi-polar (112¯2) and nonpolar a-plane (112¯0) GaN phases on r-plane cone shaped patterned sapphire substrates (CPSS) by metalorganic vapor-phase epitaxy has been investigated. With a nucleation layer grown at 535°C and 200mbar, only semi-polar (112¯2) GaN is formed. Increasing the nucleation layer temperature to 965°C, only (112¯0) GaN is grown at 200mbar. At reduced reactor pressure of 60mbar, phase selectivity breaks down and semi-polar (112¯2) and non-polar (112¯0) GaN exist simultaneously. The crystalline quality of a-plane GaN on r-plane CPSS can be effectively improved using optimized growth direction control.
► Phase control of (112¯2) and (112¯0) GaN grown on r-plane CPSS is studied. ► Growth competition between (112¯2) and (112¯0) GaN is severely influenced by the nucleation temperature. ► Optimized completion of a-plane (112¯0) GaN enables a smooth surface on r-plane CPSS. |
---|---|
ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/j.jcrysgro.2013.01.032 |