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Al-enhanced N incorporation in GaNAs alloys grown by chemical beam epitaxy
The N incorporation is studied in AlGaNAs with low Al content grown by chemical beam epitaxy at low temperature using dimethylhydrazine as the N precursor. The incorporation efficiency is significantly enhanced by introducing a relatively low Al concentration. The relation between the N incorporatio...
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Published in: | Journal of crystal growth 2013-10, Vol.380, p.256-260 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The N incorporation is studied in AlGaNAs with low Al content grown by chemical beam epitaxy at low temperature using dimethylhydrazine as the N precursor. The incorporation efficiency is significantly enhanced by introducing a relatively low Al concentration. The relation between the N incorporation and N/(N+As) flow ratio for Al concentrations of 0–15% is presented. The highest N incorporation and the best AlGaNAs crystal quality are obtained between 400°C and 440°C, where the growth mode starts to change from 2D to 3D. The activation energies for N incorporation in both the 2D and 3D growth mode regions are extracted.
•N incorporation is significantly enhanced by Al in dilute nitrides.•The crystal quality and the N incorporation are optimized between 400°C and 440°C.•3D growth mode is suppressed at low temperature improving crystalline quality.•Growth temperature study reveals two distinct temperature dependent regions.•Activation energies of the two regions are extracted using Arrhenius equation. |
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ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/j.jcrysgro.2013.06.024 |