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Al-enhanced N incorporation in GaNAs alloys grown by chemical beam epitaxy

The N incorporation is studied in AlGaNAs with low Al content grown by chemical beam epitaxy at low temperature using dimethylhydrazine as the N precursor. The incorporation efficiency is significantly enhanced by introducing a relatively low Al concentration. The relation between the N incorporatio...

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Bibliographic Details
Published in:Journal of crystal growth 2013-10, Vol.380, p.256-260
Main Authors: Kolhatkar, Gitanjali, Boucherif, Abderraouf, Valdivia, Christopher E., Wallace, Steven G., Fafard, Simon, Aimez, Vincent, Arès, Richard
Format: Article
Language:English
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Summary:The N incorporation is studied in AlGaNAs with low Al content grown by chemical beam epitaxy at low temperature using dimethylhydrazine as the N precursor. The incorporation efficiency is significantly enhanced by introducing a relatively low Al concentration. The relation between the N incorporation and N/(N+As) flow ratio for Al concentrations of 0–15% is presented. The highest N incorporation and the best AlGaNAs crystal quality are obtained between 400°C and 440°C, where the growth mode starts to change from 2D to 3D. The activation energies for N incorporation in both the 2D and 3D growth mode regions are extracted. •N incorporation is significantly enhanced by Al in dilute nitrides.•The crystal quality and the N incorporation are optimized between 400°C and 440°C.•3D growth mode is suppressed at low temperature improving crystalline quality.•Growth temperature study reveals two distinct temperature dependent regions.•Activation energies of the two regions are extracted using Arrhenius equation.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2013.06.024