A comparative study of copper electrodeposition and photoelectrodeposition on boron doped diamond

Copper (Cu) electrodeposition and photoelectrodeposition on highly boron-doped diamond films (BDD) were investigated, at two different pH solutions. Cu particles were deposited in the potentiostat mode and under UV irradiation. The as-grown as well as the Cu modified BDD films were characterized by...

Full description

Saved in:
Bibliographic Details
Published in:Diamond and related materials 2013-09, Vol.38, p.104-108
Main Authors: Couto, A.B., Ribeiro, M.C.E., Migliorini, F.L., Ferreira, N.G., Baldan, M.R.
Format: Article
Language:English
Subjects:
BDD
Condensed matter: structure, mechanical and thermal properties
Copper
Cross-disciplinary physics: materials science
rheology
Density
DEPOSITION
Diamonds
DOPING
Electrodeposition
Electrodeposition, electroplating
ELECTRODES
Exact sciences and technology
Fullerenes and related materials
diamonds, graphite
IRRADIATION
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Photoelectrodeposition
Physical radiation effects, radiation damage
Physics
SEMICONDUCTORS
Specific materials
Structure and morphology
thickness
Structure of solids and liquids
crystallography
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Copper (Cu) electrodeposition and photoelectrodeposition on highly boron-doped diamond films (BDD) were investigated, at two different pH solutions. Cu particles were deposited in the potentiostat mode and under UV irradiation. The as-grown as well as the Cu modified BDD films were characterized by Raman Spectroscopy and Scanning Electron Microscopy. The copper photocatalytic deposition on BDD was discussed taking into account the influence of the photogenerated electrons for photoelectrodeposition process at both acid and neutral pH solutions. Under UV irradiation, the copper deposits presented higher density and uniformity all over the crystal faces when compared with those without UV irradiation. This behavior may be attributed to BDD semiconductor character due to its photogenerated electrons which enhanced the copper reduction reaction. •Electrodeposition and photoelectrodeposition of copper on boron-doped diamond were obtained.•The influence of the photogenerated electrons to understand the cooper on the diamond film was discussed.•The cooper deposited presented high density and uniformity all over the crystal.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2013.06.009