Deuterium retention in mixed C–W–D films co-deposited in magnetron discharge in deuterium

Deuterium retention in C–D and C–W–D mixed films deposited in a magnetron discharge in deuterium was studied. The deuterium content in the C–D films was in the range D/C=0.65–0.75 for grounded substrates and 0.45–0.6 if a bias of −60V was applied. The deuterium content in the C–W–D films was in the...

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Bibliographic Details
Published in:Journal of nuclear materials 2013-07, Vol.438 (1-3), p.204-208
Main Authors: Krat, S., Gasparyan, Yu, Efimov, V., Mednikov, A., Zibrov, M., Pisarev, A.
Format: Article
Language:English
Subjects:
Bias
Deposition
Deuterium
Discharge
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Summary:Deuterium retention in C–D and C–W–D mixed films deposited in a magnetron discharge in deuterium was studied. The deuterium content in the C–D films was in the range D/C=0.65–0.75 for grounded substrates and 0.45–0.6 if a bias of −60V was applied. The deuterium content in the C–W–D films was in the range of D/(C+W)=0.2–0.4 without strong dependence on the C/W ratio (in the range of 0.7–10) and the substrate potential (in the range from 0 to −60V). Deuterium release from the C–W–D films was observed at lower temperatures than that from the C–D films.
ISSN:0022-3115
1873-4820
DOI:10.1016/j.jnucmat.2013.03.034