Effect of Zn Sputtering Rate on the Morphological and Optical Properties of ZnO Films

Zinc oxide (ZnO) thin films were deposited onto glass substrates by reactive radiofrequency (RF) magnetron sputtering using a metallic zinc target. Optical emission spectroscopy (OES) was used to monitor and control the Zn sputtering rate for the deposition of the ZnO films. Film thicknesses ranged...

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Bibliographic Details
Published in:Materials sciences and applications 2013-12, Vol.4 (12), p.802-807
Main Authors: Chaves, Michel, Silva, Erica Pereira da, Durrant, Steven Frederick, Cruz, Nilson Cristino da, Lisboa-Filho, Paulo Noronha, Bortoleto, José Roberto Ribeiro
Format: Article
Language:English
Subjects:
Constants
Density
Deposition
Magnetron sputtering
Sputtering
Wurtzite
Zinc
Zinc oxide
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Summary:Zinc oxide (ZnO) thin films were deposited onto glass substrates by reactive radiofrequency (RF) magnetron sputtering using a metallic zinc target. Optical emission spectroscopy (OES) was used to monitor and control the Zn sputtering rate for the deposition of the ZnO films. Film thicknesses ranged from 350 to 750 nm. Optical transmittances greater than 80% were observed in the wavelength interval from 450 nm to 650 nm. The energy gap of the films remained constant at (3.28 plus or minus 0.01) eV. The surface morphology was found to be homogeneous with well-distributed structures. Surface roughness was dependent on the Zn sputtering rate, indicating that greater densities of Zn atoms increase the surface diffusion. X-ray diffraction (XRD) analysis showed that the ZnO films were polycrystalline with a hexagonal wurtzite structure and preferential growth along the (002) plane.
ISSN:2153-117X
2153-1188
DOI:10.4236/msa.2013.412102