Impedance of NiSi electrode in sulfuric-acid solution in the region of passive and transpassive states

The behavior of an NiSi electrode in 0.5 M H 2 SO 4 in the region of passive and transpassive state (from 0.50 to 2.1 V (versus SHE)) is studied. The conclusion is made about formation of oxide film close to SiO 2 by composition on the electrode surface in the passivation process. Equivalent electri...

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Bibliographic Details
Published in:Protection of metals and physical chemistry of surfaces 2014-11, Vol.50 (6), p.809-816
Main Authors: Panteleeva, V. V., Shein, A. B., Kichigin, V. I.
Format: Article
Language:English
Subjects:
Characterization and Evaluation of Materials
Chemistry and Materials Science
Corrosion and Coatings
Electrodes
Equivalence
Impedance
Industrial Chemistry/Chemical Engineering
Inorganic Chemistry
Materials Science
Mathematical models
Metallic Materials
Nickel silicide
Oxide coatings
Physical chemistry
Physicochemical Problems of Materials Protection
Resistivity
Tribology
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Summary:The behavior of an NiSi electrode in 0.5 M H 2 SO 4 in the region of passive and transpassive state (from 0.50 to 2.1 V (versus SHE)) is studied. The conclusion is made about formation of oxide film close to SiO 2 by composition on the electrode surface in the passivation process. Equivalent electric circuit modeling passive and transpassive state of nickel silicide is proposed. Thickness of oxide film and its specific resistance depending on electrode potential are calculated basing on the impedance data.
ISSN:2070-2051
2070-206X
DOI:10.1134/S2070205114060148