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Characterisation of thin SiOx-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)
Float glass is not an inert material with non-improvable chemical durability as often perceived. Its corrosion starts whenever it becomes exposed to humidity. This process begins already immediately after production. In this paper we will demonstrate that the initial stage of float glass corrosion –...
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Published in: | Surface & coatings technology 2013-10, Vol.232, p.582-586 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Float glass is not an inert material with non-improvable chemical durability as often perceived. Its corrosion starts whenever it becomes exposed to humidity. This process begins already immediately after production. In this paper we will demonstrate that the initial stage of float glass corrosion – ion diffusion (especially Na+) to the glass surface – can be inhibited by depositing silicon oxide layers (SiOx) of approximately 50nm thickness on the float glass surface using an atmospheric pressure coating method: Combustion Chemical Vapour Deposition (C-CVD).
•The leaching behaviour of uncoated float glass was examined.•SiOx-layers were deposited under different conditions on float glass by C-CVD.•In parts these layers act as a highly effective barrier against Na+-diffusion.•Proof of SiOx layers on the float glass surface is given.•They do not affect industrial quality requirements. |
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ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2013.06.031 |