ZnO thin film synthesis by reactive radio frequency magnetron sputtering

•Band gaps of the layer are affected by the film thickness.•Nano structured ZnO deposited.•Spectral dependence of reflectance of deposited ZnO thin films. In this study, ZnO thin films were deposited on glass substrates by reactive RF magnetron sputtering method at argon–oxygen gas mixing (1:1) atmo...

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Bibliographic Details
Published in:Applied surface science 2014-11, Vol.318, p.2-5
Main Authors: Şenay, Volkan, Pat, Suat, Korkmaz, Şadan, Aydoğmuş, Tuna, Elmas, Saliha, Özen, Soner, Ekem, Naci, Balbağ, M. Zafer
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Deposition
Energy gaps (solid state)
Exact sciences and technology
Glass
Magnetron sputtering
Optical properties
Physics
Radio frequencies
RF sputtering
Surface properties
Tensiometers
Thin films
Zinc oxide
ZnO
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Summary:•Band gaps of the layer are affected by the film thickness.•Nano structured ZnO deposited.•Spectral dependence of reflectance of deposited ZnO thin films. In this study, ZnO thin films were deposited on glass substrates by reactive RF magnetron sputtering method at argon–oxygen gas mixing (1:1) atmosphere. Some properties of the synthesized films were investigated by interferometry, UV–vis spectrophotometer, atomic force microscopy, and tensiometer. Tauc method was adopted to estimate the optical band gaps. The band gaps of the deposited films were affected by film thickness. We concluded that the surface composition plays a substantial role in the values of the band gaps. Nanocrystalline structures were detected in all produced samples.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2013.10.044