Investigation of a chalcohalide glass optical waveguide structure fabricated by dual-energy carbon-ion implantation

A planar waveguide structure in a chalcohalide glass was fabricated by dual-energy C ion implantation with energies of 5.5 and 6.0 MeV at fluences of 7.0×10¹⁴ and 8.0×10¹⁴ions cm⁻², respectively. A waveguide with a thickness of 5.9 μm was formed. SRIM 2013 was used to simulate the defect distributio...

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Bibliographic Details
Published in:Applied optics (2004) 2014-01, Vol.53 (2), p.278-282
Main Authors: Yu, Xiao-Fei, Liu, Tao, Zhang, Lian, Zhou, Yu-Fan, Wang, Tie-Jun, Wang, Xue-Lin
Format: Article
Language:English
Subjects:
Glass
Implantation
Ion implantation
Microscopes
Polished
Reinforced reaction injection molding
Simulation
Spectra
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Summary:A planar waveguide structure in a chalcohalide glass was fabricated by dual-energy C ion implantation with energies of 5.5 and 6.0 MeV at fluences of 7.0×10¹⁴ and 8.0×10¹⁴ions cm⁻², respectively. A waveguide with a thickness of 5.9 μm was formed. SRIM 2013 was used to simulate the defect distribution fabricated by C ion implantation. Images of the polished end face of the C-implanted chalcohalide glass were measured with a metallographic microscope using reflected polarized light. The micro-Raman spectra were measured in air. The near-field intensity distributions were investigated at visible (633 nm) and near-infrared (1300, 1400, and 1539 nm) bands.
ISSN:1559-128X
2155-3165
DOI:10.1364/AO.53.000278