XPS Analysis of Ti6Al4V Oxidation Under UHV Conditions

Oxidation of Ti6Al4V is studied by X-ray photoelectron spectroscopy (XPS). Oxide layer growth was monitored on the Ti6Al4V surface for 24 hours. The surface was previously etched with Ar + ions under ultra-high vacuum conditions. XPS spectra show that TiO and Ti 2 O 3 , together with Al 2 O 3 , were...

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Bibliographic Details
Published in:Metallurgical and materials transactions. A, Physical metallurgy and materials science Physical metallurgy and materials science, 2014-12, Vol.45 (13), p.6285-6290
Main Authors: Hierro-Oliva, M., Gallardo-Moreno, A. M., González-Martín, M. L.
Format: Article
Language:English
Subjects:
Aluminum oxide
Applied sciences
Availability
Characterization and Evaluation of Materials
Chemistry and Materials Science
Exact sciences and technology
Materials Science
Metallic Materials
Metals. Metallurgy
Nanotechnology
Oxidation
Oxides
Spectra
Structural Materials
Surfaces and Interfaces
Thin Films
Titanium base alloys
Titanium dioxide
X-ray photoelectron spectroscopy
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Summary:Oxidation of Ti6Al4V is studied by X-ray photoelectron spectroscopy (XPS). Oxide layer growth was monitored on the Ti6Al4V surface for 24 hours. The surface was previously etched with Ar + ions under ultra-high vacuum conditions. XPS spectra show that TiO and Ti 2 O 3 , together with Al 2 O 3 , were the earliest oxides formed. Vanadium, despite being detected in its elementary form in the bulk, was not found in any of its oxidized states. TiO 2 , directly related to the good performance of Ti6Al4V for biomedical applications, did not contribute significantly to the passive layer at the beginning; nevertheless, it was identified after the oxidation process progressed to a more advanced stage. This behavior indicates that reoxidation of Ti6Al4V permits auto-healing of its passive layer, with the presence of TiO 2 , even in conditions of low oxygen availability.
ISSN:1073-5623
1543-1940
DOI:10.1007/s11661-014-2570-0