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Mapping Charge-Carrier Density Across the p-n Junction in Ambipolar Carbon-Nanotube Networks by Raman Microscopy
In situ confocal Raman microscopy is used to map the recombination zone (induced p–n junction) in an ambipolar carbon‐nanotube‐network transistor with high spatial resolution. The shift of the 2D mode (G’ mode) depending on hole and electron accumulation serves as a measure for the local charge‐carr...
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Published in: | Advanced materials (Weinheim) 2014-12, Vol.26 (47), p.7986-7992 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | In situ confocal Raman microscopy is used to map the recombination zone (induced p–n junction) in an ambipolar carbon‐nanotube‐network transistor with high spatial resolution. The shift of the 2D mode (G’ mode) depending on hole and electron accumulation serves as a measure for the local charge‐carrier density and provides complementary information about charge transport and recombination in ambipolar transistors. |
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ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.201403655 |