A General Design Strategy for Block Copolymer Directed Self-Assembly Patterning of Integrated Circuits Contact Holes using an Alphabet Approach

Directed self-assembly (DSA) is a promising lithography candidate for technology nodes beyond 14 nm. Researchers have shown contact hole patterning for random logic circuits using DSA with small physical templates. This paper introduces an alphabet approach that uses a minimal set of small physical...

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Bibliographic Details
Published in:Nano letters 2015-02, Vol.15 (2), p.805-812
Main Authors: Yi, He, Bao, Xin-Yu, Tiberio, Richard, Wong, H.-S. Philip
Format: Article
Language:English
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Summary:Directed self-assembly (DSA) is a promising lithography candidate for technology nodes beyond 14 nm. Researchers have shown contact hole patterning for random logic circuits using DSA with small physical templates. This paper introduces an alphabet approach that uses a minimal set of small physical templates to pattern all contacts configurations on integrated circuits. We illustrate, through experiments, a general and scalable template design strategy that links the DSA material properties to the technology node requirements.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl502172m