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P-25: Top Gate Amorphous In-Ga-Zn-O Thin Film Transistors Fabricated on Soda-Lime-Silica Glass Substrates
This work presents a comparative analysis of top gate a‐IGZO TFTs fabricated on both soda‐lime‐silica glass and alkali‐free borosilicate glass. Low‐temperature ALD is selected for the deposition of gate dielectric to minimize a thermal stress. Comparing with TFTs on alkali‐free borosilicate glass, T...
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Published in: | SID International Symposium Digest of technical papers 2014-06, Vol.45 (1), p.1035-1038 |
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description | This work presents a comparative analysis of top gate a‐IGZO TFTs fabricated on both soda‐lime‐silica glass and alkali‐free borosilicate glass. Low‐temperature ALD is selected for the deposition of gate dielectric to minimize a thermal stress. Comparing with TFTs on alkali‐free borosilicate glass, TFTs with soda‐lime‐glass show similar threshold voltage and sub‐threshold swing, but slightly degraded effective mobility, stability and uniformity. The results of atomic force measurements are provided to explain the uniformity degradation. |
doi_str_mv | 10.1002/j.2168-0159.2014.tb00269.x |
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subjects | a-IGZO borosilicate Borosilicate glasses Degradation Deposition Gates Glass Glass substrates Semiconductor devices soda-lime soda-lime-silica stability substrate TFT Thin film transistors Thin films thin-film transistor uniformity Variability |
title | P-25: Top Gate Amorphous In-Ga-Zn-O Thin Film Transistors Fabricated on Soda-Lime-Silica Glass Substrates |
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