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Thermal behaviour of chromium nitride/titanium–titanium carbonitride multilayers

Chromium nitride/titanium–titanium carbonitride multilayers composed of a 40nm Cr interface followed by a 4.4μm thick Cr2N layer, a 150nm thick Ti layer, and a 1 μm thick TiCxNy top layer were deposited on silicon wafers by magnetron sputtering. The structural changes and the phase content changes o...

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Bibliographic Details
Published in:Thin solid films 2014-07, Vol.562, p.159-165
Main Authors: Angerer, P., Lackner, J.M., Wiessner, M., Maier, G.A., Major, L.
Format: Article
Language:English
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Summary:Chromium nitride/titanium–titanium carbonitride multilayers composed of a 40nm Cr interface followed by a 4.4μm thick Cr2N layer, a 150nm thick Ti layer, and a 1 μm thick TiCxNy top layer were deposited on silicon wafers by magnetron sputtering. The structural changes and the phase content changes of these multilayer samples were studied by means of high-temperature in-situ X-ray diffraction experiments at temperatures up to 550°C. The lattice constants of the Cr phase as well as the Ti phase display an aberrant expansion behaviour during these experiments which is influenced by the defect structure, a nitrogen incorporation, and residual stress in the layers. The results were compared with structural data obtained by ex-situ transmission electron microscopy investigations of pristine and heated material, revealing phase separation and strong diffusion phenomena. •Magnetron sputtering of chromium nitride/titanium–titanium carbonitride layers•High temperature in-situ observations of structural changes up to 550°C performed•Formation of crystalline TiN,TiCxNy, Cr2N, and metallic Cr phases observed•Aberrant variations of the cell parameters of the Ti metal phase were found.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2014.04.021