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Thermal behaviour of chromium nitride/titanium–titanium carbonitride multilayers
Chromium nitride/titanium–titanium carbonitride multilayers composed of a 40nm Cr interface followed by a 4.4μm thick Cr2N layer, a 150nm thick Ti layer, and a 1 μm thick TiCxNy top layer were deposited on silicon wafers by magnetron sputtering. The structural changes and the phase content changes o...
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Published in: | Thin solid films 2014-07, Vol.562, p.159-165 |
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description | Chromium nitride/titanium–titanium carbonitride multilayers composed of a 40nm Cr interface followed by a 4.4μm thick Cr2N layer, a 150nm thick Ti layer, and a 1 μm thick TiCxNy top layer were deposited on silicon wafers by magnetron sputtering. The structural changes and the phase content changes of these multilayer samples were studied by means of high-temperature in-situ X-ray diffraction experiments at temperatures up to 550°C. The lattice constants of the Cr phase as well as the Ti phase display an aberrant expansion behaviour during these experiments which is influenced by the defect structure, a nitrogen incorporation, and residual stress in the layers. The results were compared with structural data obtained by ex-situ transmission electron microscopy investigations of pristine and heated material, revealing phase separation and strong diffusion phenomena.
•Magnetron sputtering of chromium nitride/titanium–titanium carbonitride layers•High temperature in-situ observations of structural changes up to 550°C performed•Formation of crystalline TiN,TiCxNy, Cr2N, and metallic Cr phases observed•Aberrant variations of the cell parameters of the Ti metal phase were found. |
doi_str_mv | 10.1016/j.tsf.2014.04.021 |
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•Magnetron sputtering of chromium nitride/titanium–titanium carbonitride layers•High temperature in-situ observations of structural changes up to 550°C performed•Formation of crystalline TiN,TiCxNy, Cr2N, and metallic Cr phases observed•Aberrant variations of the cell parameters of the Ti metal phase were found.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2014.04.021</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Carbonitrides ; Chromium ; Chromium nitride ; Composition and phase identification ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Diffraction ; Exact sciences and technology ; Magnetron sputtering ; Materials science ; Mechanical and acoustical properties ; Methods of deposition of films and coatings; film growth and epitaxy ; Multilayer ; Multilayers ; Phase separation ; Physical properties of thin films, nonelectronic ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thermal stability; thermal effects ; Thin film structure and morphology ; Titanium ; X-ray diffraction techniques</subject><ispartof>Thin solid films, 2014-07, Vol.562, p.159-165</ispartof><rights>2014</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c360t-c91693d68e903916caad00e1c9f961c09fea3c94f785991faf97e23085ed45dc3</citedby><cites>FETCH-LOGICAL-c360t-c91693d68e903916caad00e1c9f961c09fea3c94f785991faf97e23085ed45dc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,778,782,27907,27908</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=28538610$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Angerer, P.</creatorcontrib><creatorcontrib>Lackner, J.M.</creatorcontrib><creatorcontrib>Wiessner, M.</creatorcontrib><creatorcontrib>Maier, G.A.</creatorcontrib><creatorcontrib>Major, L.</creatorcontrib><title>Thermal behaviour of chromium nitride/titanium–titanium carbonitride multilayers</title><title>Thin solid films</title><description>Chromium nitride/titanium–titanium carbonitride multilayers composed of a 40nm Cr interface followed by a 4.4μm thick Cr2N layer, a 150nm thick Ti layer, and a 1 μm thick TiCxNy top layer were deposited on silicon wafers by magnetron sputtering. The structural changes and the phase content changes of these multilayer samples were studied by means of high-temperature in-situ X-ray diffraction experiments at temperatures up to 550°C. The lattice constants of the Cr phase as well as the Ti phase display an aberrant expansion behaviour during these experiments which is influenced by the defect structure, a nitrogen incorporation, and residual stress in the layers. The results were compared with structural data obtained by ex-situ transmission electron microscopy investigations of pristine and heated material, revealing phase separation and strong diffusion phenomena.
•Magnetron sputtering of chromium nitride/titanium–titanium carbonitride layers•High temperature in-situ observations of structural changes up to 550°C performed•Formation of crystalline TiN,TiCxNy, Cr2N, and metallic Cr phases observed•Aberrant variations of the cell parameters of the Ti metal phase were found.</description><subject>Carbonitrides</subject><subject>Chromium</subject><subject>Chromium nitride</subject><subject>Composition and phase identification</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Diffraction</subject><subject>Exact sciences and technology</subject><subject>Magnetron sputtering</subject><subject>Materials science</subject><subject>Mechanical and acoustical properties</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Multilayer</subject><subject>Multilayers</subject><subject>Phase separation</subject><subject>Physical properties of thin films, nonelectronic</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thermal stability; thermal effects</subject><subject>Thin film structure and morphology</subject><subject>Titanium</subject><subject>X-ray diffraction techniques</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNp9UM1KAzEQDqJgrT6At70IXnY7s2nTDZ6k-AcFQeo5pNkJTdmfmuwWevMdfEOfxJRWj8IHMwzfD_Mxdo2QIaAYrbMu2CwHHGcQkeMJG2AxlWk-5XjKBgBjSAVIOGcXIawBAPOcD9jbYkW-1lWypJXeurb3SWsTs_Jt7fo6aVznXUmjznW6iYfvz6_fNTHaL9sjIan7qnOV3pEPl-zM6irQ1XEO2fvjw2L2nM5fn15m9_PUcAFdaiQKyUtRkAQed6N1CUBopJUCDUhLmhs5ttNiIiVabeWUcg7FhMrxpDR8yG4PvhvffvQUOlW7YKiqdENtHxQKARAjACIVD1Tj2xA8WbXxrtZ-pxDUvj-1VrE_te9PQUSOUXNztNfB6Mp63RgX_oR5MeGFwL333YFH8detI6-CcdQYKp0n06mydf-k_ADWc4fm</recordid><startdate>20140701</startdate><enddate>20140701</enddate><creator>Angerer, P.</creator><creator>Lackner, J.M.</creator><creator>Wiessner, M.</creator><creator>Maier, G.A.</creator><creator>Major, L.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20140701</creationdate><title>Thermal behaviour of chromium nitride/titanium–titanium carbonitride multilayers</title><author>Angerer, P. ; Lackner, J.M. ; Wiessner, M. ; Maier, G.A. ; Major, L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c360t-c91693d68e903916caad00e1c9f961c09fea3c94f785991faf97e23085ed45dc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Carbonitrides</topic><topic>Chromium</topic><topic>Chromium nitride</topic><topic>Composition and phase identification</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition by sputtering</topic><topic>Diffraction</topic><topic>Exact sciences and technology</topic><topic>Magnetron sputtering</topic><topic>Materials science</topic><topic>Mechanical and acoustical properties</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Multilayer</topic><topic>Multilayers</topic><topic>Phase separation</topic><topic>Physical properties of thin films, nonelectronic</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thermal stability; thermal effects</topic><topic>Thin film structure and morphology</topic><topic>Titanium</topic><topic>X-ray diffraction techniques</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Angerer, P.</creatorcontrib><creatorcontrib>Lackner, J.M.</creatorcontrib><creatorcontrib>Wiessner, M.</creatorcontrib><creatorcontrib>Maier, G.A.</creatorcontrib><creatorcontrib>Major, L.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Angerer, P.</au><au>Lackner, J.M.</au><au>Wiessner, M.</au><au>Maier, G.A.</au><au>Major, L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Thermal behaviour of chromium nitride/titanium–titanium carbonitride multilayers</atitle><jtitle>Thin solid films</jtitle><date>2014-07-01</date><risdate>2014</risdate><volume>562</volume><spage>159</spage><epage>165</epage><pages>159-165</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Chromium nitride/titanium–titanium carbonitride multilayers composed of a 40nm Cr interface followed by a 4.4μm thick Cr2N layer, a 150nm thick Ti layer, and a 1 μm thick TiCxNy top layer were deposited on silicon wafers by magnetron sputtering. The structural changes and the phase content changes of these multilayer samples were studied by means of high-temperature in-situ X-ray diffraction experiments at temperatures up to 550°C. The lattice constants of the Cr phase as well as the Ti phase display an aberrant expansion behaviour during these experiments which is influenced by the defect structure, a nitrogen incorporation, and residual stress in the layers. The results were compared with structural data obtained by ex-situ transmission electron microscopy investigations of pristine and heated material, revealing phase separation and strong diffusion phenomena.
•Magnetron sputtering of chromium nitride/titanium–titanium carbonitride layers•High temperature in-situ observations of structural changes up to 550°C performed•Formation of crystalline TiN,TiCxNy, Cr2N, and metallic Cr phases observed•Aberrant variations of the cell parameters of the Ti metal phase were found.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2014.04.021</doi><tpages>7</tpages></addata></record> |
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subjects | Carbonitrides Chromium Chromium nitride Composition and phase identification Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Diffraction Exact sciences and technology Magnetron sputtering Materials science Mechanical and acoustical properties Methods of deposition of films and coatings film growth and epitaxy Multilayer Multilayers Phase separation Physical properties of thin films, nonelectronic Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thermal stability thermal effects Thin film structure and morphology Titanium X-ray diffraction techniques |
title | Thermal behaviour of chromium nitride/titanium–titanium carbonitride multilayers |
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