29.3: Invited Paper: The Mechanical Reliability of Flexible ALD Barrier Films

In this paper, we present the results of mechanical testing that reveals the onset crack strain and fatigue crack growth of TiO2 and Al2O3 films deposited by atomic layer deposition. Data show that both films have a strong thickness dependence of the onset crack strain, with the strain reducing with...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2013-06, Vol.44 (1), p.361-364
Main Authors: Bulusu, Anuradha, Behm, Henrik, Sadeghi-Tohidi, Farzad, Bahre, Hendrick, Baumert, Eva, Samet, David, Hopmann, Christian, Winter, Jörg, Pierron, Olivier, Graham, Samuel
Format: Article
Language:English
Subjects:
ALD
Aluminum oxide
barrier films
cracking
Cracks
Deposition
fatigue
Fatigue failure
Film thickness
Fracture mechanics
mechanical reliability
R&D
Research & development
Strain
Titanium dioxide
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Summary:In this paper, we present the results of mechanical testing that reveals the onset crack strain and fatigue crack growth of TiO2 and Al2O3 films deposited by atomic layer deposition. Data show that both films have a strong thickness dependence of the onset crack strain, with the strain reducing with increasing film thickness. Additionally, TiO2 films have a lower onset crack strain and strain for fatigue damage than Al2O3. However, TiO2 films are more resilient in harsh environments where fatigue damage in Al2O3 films grows faster.
ISSN:0097-966X
2168-0159
DOI:10.1002/j.2168-0159.2013.tb06221.x