Analyzing the LiF thin films deposited at different substrate temperatures using multifractal technique

• Published in: Thin solid films 2014-07, Vol.562, p.126-131
• Main Authors: Yadav, R.P., Dwivedi, S., Mittal, A.K., Kumar, Manvendra, Pandey, A.C.
• Format: Article
• Language: English
• Subjects: Atomic force microscopy; Clusters; Condensed matter: structure, mechanical and thermal properties; Deposition; Exact sciences and technology; Fractal analysis; Fractals; Lithium fluoride; Multifractal analysis; Multifractal detrended moving average; Physics; Structure and morphology; thickness; Surface morphology; Surface roughness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Thin films; Two dimensional
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2014.04.005

The Atomic Force Microscopy technique is used to characterize the surface morphology of LiF thin films deposited at substrate temperatures 77K, 300K and 500K, respectively. It is found that the surface roughness of thin film increases with substrate temperature. The multifractal nature of the LiF thin film at each substrate temperature is investigated using the backward two-dimensional multifractal detrended moving average analysis. The strength of multifractility and the non-uniformity of the height probabilities of the thin films increase as the substrate temperature increases. Both the width of the multifractal spectrum and the difference of fractal dimensions of the thin films increase sharply as the temperature reaches 500K, indicating that the multifractility of the thin films becomes more pronounced at the higher substrate temperatures with greater cluster size. •Analyzing LiF thin films using multifractal detrended moving average technique•Surface roughness of LiF thin film increases with substrate temperature.•LiF thin films at each substrate temperature exhibit multifractality.•Multifractility becomes more pronounced at the higher substrate temperatures.