Application of multi-mask layers for high aspect ratio soft mold imprint

Soft mold imprinting has been widely used to improve quality and uniformity in large area nano-imprint processes because of its flexibility. However, the aspect ratio of soft mold imprinting is limited because of its physical properties. In this paper, a multi-mask layers transfer process was demons...

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Bibliographic Details
Published in:Journal of micromechanics and microengineering 2012-12, Vol.22 (12), p.125025-5
Main Authors: Wang, Zhihao, Sun, Tangyou, Wang, Lei, Zuo, Qiang, Zhao, Yanli, Xu, Zhimou, Liu, Wen
Format: Article
Language:English
Subjects:
Aspect ratio
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Flexibility
Fundamental areas of phenomenology (including applications)
Gallium nitrides
High aspect ratio
Masks
Materials science
Methods of nanofabrication
Molds
multimask layer
nanoimprint lithography
Nanoscale pattern formation
Optical materials
Optics
Photonic bandgap materials
Photonic crystals
Physical properties
Physics
uniformity
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Summary:Soft mold imprinting has been widely used to improve quality and uniformity in large area nano-imprint processes because of its flexibility. However, the aspect ratio of soft mold imprinting is limited because of its physical properties. In this paper, a multi-mask layers transfer process was demonstrated to realize a high aspect ratio in the soft mold imprint process. In this process, a thin hard mask was used as an intermediate mask for a high aspect ratio mask layer fabrication. Based on this, a 60 nm line width gratings mask, whose aspect ratio is higher than 4, was fabricated; we also realized a uniform photonic crystal (PC) pattern on large and rough gallium nitride (GaN) epitaxial wafers.
ISSN:0960-1317
1361-6439
DOI:10.1088/0960-1317/22/12/125025