Evaluation of an Nd doping effect on characteristic properties of tin oxide

In the present work, transparent and conductive Nd doped SnO2 thin films were deposited via spray pyrolysis. Crystallographic, morphological, optical and electrical characterizations of SnO2 were researched as a function of Nd doping. The XRD analysis indicated the films had tetragonal cassiterite t...

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Bibliographic Details
Published in:Materials science in semiconductor processing 2015-02, Vol.30, p.233-241
Main Authors: Turgut, G., Sonmez, E., Duman, S.
Format: Article
Language:English
Subjects:
Doping
Materials science
Micrographs
Nd doping
Neodymium
Resistivity
Semiconductors
Spray pyrolysis
Structural properties
Tin dioxide
Tin oxide
Tin oxides
Williamson–Hall method
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Summary:In the present work, transparent and conductive Nd doped SnO2 thin films were deposited via spray pyrolysis. Crystallographic, morphological, optical and electrical characterizations of SnO2 were researched as a function of Nd doping. The XRD analysis indicated the films had tetragonal cassiterite tin oxide structure and (211) preferential direction for NdTO-0, NdTO-1, NdTO-2 and NdTO-3 samples changed to (110) plane for NdTO-4 and NdTO-5 samples. The crystalline size and strain analysis were made by using a Williamson–Hall method. The SEM micrographs showed that all films had homogenously scattered pyramidal and small densely nanoparticles. The optical analysis indicated optical band gap value of undoped film increased with 1at% Nd doping and then it decreased with more Nd content. The Hall measurements indicated that the highest electrical conductivity was obtained for 2at% Nd doping content.
ISSN:1369-8001
1873-4081
DOI:10.1016/j.mssp.2014.10.008