Properties of hydrogenated amorphous/nanocrystalline carbon films prepared by plasma enhanced chemical vapour deposition

A capacitively coupled plasma reactor was used for PECVD technology, where methane was introduced into the plasma reactor through the shower head. The concentration of species in the carbon films were determined by RBS and ERD method. The RBS results showed the main concentrations of C in the films....

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2010-01, Vol.12 (1), p.012005-012005
Main Authors: Huran, J, Zat'ko, B, Boháček, P, Kobzev, A P, Vincze, A, Malinovský, E, Valovič, A
Format: Article
Language:English
Subjects:
Carbon
Chemical composition
Conferences
Infrared radiation
Infrared spectroscopy
Methane
Nanocrystals
Plasma enhanced chemical vapor deposition
Reactors
Showers
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Summary:A capacitively coupled plasma reactor was used for PECVD technology, where methane was introduced into the plasma reactor through the shower head. The concentration of species in the carbon films were determined by RBS and ERD method. The RBS results showed the main concentrations of C in the films. The concentration of hydrogen was approximately 20 at.%. The films contain a small amount of oxygen and nitrogen. Chemical compositions were analyzed by FTIR spectroscopy. IR results showed the presence of C-H specific bonds.
ISSN:1757-899X
1757-8981
1757-899X
DOI:10.1088/1757-899X/12/1/012005