Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

Novel alkaline developable top-coat materials containing a bulky silicon group are presented. This bulky silicon group endows transparency at 193nm wavelength and hydrophobicity to the top-coat. Good pattern profiles and negligible changes of lithographic performance are confirmed on ArF photoresist...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2006, Vol.19(5), pp.579-583
Main Authors: Hata, Mitsuhiro, Ryoo, Man-Hyoung, Choi, Sang-Jun, Cho, Han-Ku
Format: Article
Language:English
Subjects:
ArF immersion lithography
Hydrophobicity
Immersion
Lithography
Photopolymers
Photoresists
receding angle
Silicon
Solvents
top-coat
Wavelengths
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Description
Summary:Novel alkaline developable top-coat materials containing a bulky silicon group are presented. This bulky silicon group endows transparency at 193nm wavelength and hydrophobicity to the top-coat. Good pattern profiles and negligible changes of lithographic performance are confirmed on ArF photoresists. Receding angle of this top-coat is 90o, which is the highest among alkaline developable top-coats reported to date, and only comparable by solvent soluble-typetop-coat TSP3A.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.19.579