investigation on hysteresis process of ZnO film deposition and changes of surface morphology and wettability

Plasma Optical Emission Spectroscopy was employed to investigate hysteresis process of reactive sputtering with high purity Zn target in the presence of Ar plus O₂ plasma. An optimal working point was obtained through analyzing hysteretic curve in order to deposit high quality ZnO film. Scanning Ele...

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Bibliographic Details
Published in:Materials letters 2012-02, Vol.68, p.320-323
Main Authors: Wang, Qing, Ba, De-chun, Zhang, Yi-chen, Jiang, Rong-heng
Format: Article
Language:English
Subjects:
Contact angle
crystal structure
Flow rate
Hysteresis
Optimization
oxygen
scanning electron microscopes
Scanning electron microscopy
spectroscopy
Wettability
X-radiation
Zinc
Zinc oxide
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Summary:Plasma Optical Emission Spectroscopy was employed to investigate hysteresis process of reactive sputtering with high purity Zn target in the presence of Ar plus O₂ plasma. An optimal working point was obtained through analyzing hysteretic curve in order to deposit high quality ZnO film. Scanning Electron Microscope was used to characterize effects of various O₂ flow rate on surface crystal structure of samples. The SEM results indicate that the structure of ZnO film is strongly dependent on O₂ flow rate at constant pressure and power. Specially, At 1.6sccm O₂ flow rate, the sample with best crystallite structure has been observed. Energy-dispersive X-ray Spectroscopy also demonstrates the relationship between the chemical compositions of ZnO films and O₂ flow rate. The film to 1.6sccm O₂ shows the optimal atom ratio of Zn to O and the mass ratio of Zn to O. The water contact angle measurement also shows various O₂ flow rate strongly affects wettability.
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2011.10.086