Characteristics of SiH4/H2 VHF plasma produced by short gap discharge

A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure....

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Bibliographic Details
Published in:Surface & coatings technology 2011-07, Vol.205, p.S411-S414
Main Authors: Nishimiya, Tatsuyuki, Yamane, Tsukasa, Nakao, Sachiko, Takeuchi, Yoshiaki, Yamauchi, Yasuhiro, Takatsuka, Hiromu, Muta, Hiroshi, Uchino, Kiichiro, Kawai, Yoshinobu
Format: Article
Language:English
Subjects:
Coatings
Cross-disciplinary physics: materials science
rheology
Discharge
Electric potential
Electric power generation
Electrodes
Electron trapping
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Saturation
Sheath potential
Short gap discharge
Surface treatments
Thin film solar cell
Trapping
VHF
VHF plasma
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Summary:A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2011.02.043