Electrodeposited nanostructured WO3 thin films for photoelectrochemical applications

Thin films of WO3 were deposited on FTO-coated glass substrates by electrodeposition using aqueous solutions of peroxotungstic acid. The effects of varying the tungsten concentration of peroxotungstic acid and deposition time on the mineralogical, microstructural, morphological, optical, and photoel...

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Bibliographic Details
Published in:Electrochimica acta 2012-07, Vol.75, p.371-380
Main Authors: Kwong, W.L., Savvides, N., Sorrell, C.C.
Format: Article
Language:English
Subjects:
Chemistry
Computational efficiency
Computing time
Deposition
Electrochemistry
Electrodeposition
Exact sciences and technology
Film thickness
General and physical chemistry
Microstructure
Photocurrent
Photoelectrochemical
Photoelectrochemistry. Electrochemiluminescence
Thin films
Tungsten
Tungsten concentration
Tungsten oxides
Tungsten trioxide
Voltammetry
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Summary:Thin films of WO3 were deposited on FTO-coated glass substrates by electrodeposition using aqueous solutions of peroxotungstic acid. The effects of varying the tungsten concentration of peroxotungstic acid and deposition time on the mineralogical, microstructural, morphological, optical, and photoelectrochemical properties were determined using X-ray diffraction, scanning electron microscopy, focused ion beam milling, UV–vis spectrophotometry, and linear potentiodynamic voltammetry, respectively. The films consisted of monoclinic WO3 of grain sizes in the range 77–122nm and thicknesses in the range 258–1394nm; the true porosities were
ISSN:0013-4686
1873-3859
DOI:10.1016/j.electacta.2012.05.019