Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer

A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having g...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2013-09, Vol.25 (35), p.4875-4878
Main Authors: Yuan, Chao, Jin, Kaikai, Li, Kai, Diao, Shen, Tong, Jiawei, Fang, Qiang
Format: Article
Language:English
Subjects:
Amorphous structure
Dielectric constant
Dielectric loss
Dielectrics
Fluoropolymers
Insulators
low k materials
Materials science
Mechanical properties
Thermal stability
Thin films
thin solid films
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Summary:A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201302021