Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer

A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having g...

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Published in:Advanced materials (Weinheim) 2013-09, Vol.25 (35), p.4875-4878
Main Authors: Yuan, Chao, Jin, Kaikai, Li, Kai, Diao, Shen, Tong, Jiawei, Fang, Qiang
Format: Article
Language:English
Subjects:
Amorphous structure
Dielectric constant
Dielectric loss
Dielectrics
Fluoropolymers
Insulators
low k materials
Materials science
Mechanical properties
Thermal stability
Thin films
thin solid films
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cited_by cdi_FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873
cites cdi_FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873
container_end_page 4878
container_issue 35
container_start_page 4875
container_title Advanced materials (Weinheim)
container_volume 25
creator Yuan, Chao
Jin, Kaikai
Li, Kai
Diao, Shen
Tong, Jiawei
Fang, Qiang
description A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.
doi_str_mv 10.1002/adma.201302021
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1671466187</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1438569761</sourcerecordid><originalsourceid>FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873</originalsourceid><addsrcrecordid>eNqNkU1rGzEURUVoSdy02yyDoJtsxn3S6GNm6SR1UnDcgttmKWRJQybRWI40g-t_XxmnJnTTrh6Icw_v6SJ0RmBMAOgnbTs9pkBKoEDJERoRTknBoOZv0Ajqkhe1YNUJepfSIwDUAsQxOqFlxaWkbIQW87AqvoUYhoRnYVM84evWeWf62Bo8bX2X8KVOzuKwwhrP3QYv-jiYfoja40kX4vphF536ITvWwW87F9-jt432yX14mafox_Tz96vbYvb15svVZFYYToAU2km7tNAIa6u8u-RcsJoJx7iAkjbAS7d0Wlay5M3SWKINB2lspbkUwPLzKbrYe9cxPA8u9aprk3He65XLSykiJGFCkP9BWf4RUUtBMvrxL_QxDHGVD1GUC0pYTdlOON5TJoaUomvUOradjltFQO2aUbtm1KGZHDh_0Q7LztkD_qeKDNR7YNN6t_2HTk2u7yav5cU-26be_TpkdXxSQpaSq_v5jeIzeXv38_5SLcrfeiCnLQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2562149247</pqid></control><display><type>article</type><title>Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer</title><source>Wiley</source><creator>Yuan, Chao ; Jin, Kaikai ; Li, Kai ; Diao, Shen ; Tong, Jiawei ; Fang, Qiang</creator><creatorcontrib>Yuan, Chao ; Jin, Kaikai ; Li, Kai ; Diao, Shen ; Tong, Jiawei ; Fang, Qiang</creatorcontrib><description>A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.201302021</identifier><identifier>PMID: 23857724</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Amorphous structure ; Dielectric constant ; Dielectric loss ; Dielectrics ; Fluoropolymers ; Insulators ; low k materials ; Materials science ; Mechanical properties ; Thermal stability ; Thin films ; thin solid films</subject><ispartof>Advanced materials (Weinheim), 2013-09, Vol.25 (35), p.4875-4878</ispartof><rights>Copyright © 2013 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><rights>Copyright © 2013 WILEY-VCH Verlag GmbH &amp; Co. KGaA, Weinheim.</rights><rights>Copyright Wiley Subscription Services, Inc. Sep 2013</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873</citedby><cites>FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23857724$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Yuan, Chao</creatorcontrib><creatorcontrib>Jin, Kaikai</creatorcontrib><creatorcontrib>Li, Kai</creatorcontrib><creatorcontrib>Diao, Shen</creatorcontrib><creatorcontrib>Tong, Jiawei</creatorcontrib><creatorcontrib>Fang, Qiang</creatorcontrib><title>Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer</title><title>Advanced materials (Weinheim)</title><addtitle>Adv. Mater</addtitle><description>A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.</description><subject>Amorphous structure</subject><subject>Dielectric constant</subject><subject>Dielectric loss</subject><subject>Dielectrics</subject><subject>Fluoropolymers</subject><subject>Insulators</subject><subject>low k materials</subject><subject>Materials science</subject><subject>Mechanical properties</subject><subject>Thermal stability</subject><subject>Thin films</subject><subject>thin solid films</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqNkU1rGzEURUVoSdy02yyDoJtsxn3S6GNm6SR1UnDcgttmKWRJQybRWI40g-t_XxmnJnTTrh6Icw_v6SJ0RmBMAOgnbTs9pkBKoEDJERoRTknBoOZv0Ajqkhe1YNUJepfSIwDUAsQxOqFlxaWkbIQW87AqvoUYhoRnYVM84evWeWf62Bo8bX2X8KVOzuKwwhrP3QYv-jiYfoja40kX4vphF536ITvWwW87F9-jt432yX14mafox_Tz96vbYvb15svVZFYYToAU2km7tNAIa6u8u-RcsJoJx7iAkjbAS7d0Wlay5M3SWKINB2lspbkUwPLzKbrYe9cxPA8u9aprk3He65XLSykiJGFCkP9BWf4RUUtBMvrxL_QxDHGVD1GUC0pYTdlOON5TJoaUomvUOradjltFQO2aUbtm1KGZHDh_0Q7LztkD_qeKDNR7YNN6t_2HTk2u7yav5cU-26be_TpkdXxSQpaSq_v5jeIzeXv38_5SLcrfeiCnLQ</recordid><startdate>20130920</startdate><enddate>20130920</enddate><creator>Yuan, Chao</creator><creator>Jin, Kaikai</creator><creator>Li, Kai</creator><creator>Diao, Shen</creator><creator>Tong, Jiawei</creator><creator>Fang, Qiang</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>7X8</scope><scope>7U5</scope><scope>L7M</scope></search><sort><creationdate>20130920</creationdate><title>Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer</title><author>Yuan, Chao ; Jin, Kaikai ; Li, Kai ; Diao, Shen ; Tong, Jiawei ; Fang, Qiang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Amorphous structure</topic><topic>Dielectric constant</topic><topic>Dielectric loss</topic><topic>Dielectrics</topic><topic>Fluoropolymers</topic><topic>Insulators</topic><topic>low k materials</topic><topic>Materials science</topic><topic>Mechanical properties</topic><topic>Thermal stability</topic><topic>Thin films</topic><topic>thin solid films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yuan, Chao</creatorcontrib><creatorcontrib>Jin, Kaikai</creatorcontrib><creatorcontrib>Li, Kai</creatorcontrib><creatorcontrib>Diao, Shen</creatorcontrib><creatorcontrib>Tong, Jiawei</creatorcontrib><creatorcontrib>Fang, Qiang</creatorcontrib><collection>Istex</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>MEDLINE - Academic</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yuan, Chao</au><au>Jin, Kaikai</au><au>Li, Kai</au><au>Diao, Shen</au><au>Tong, Jiawei</au><au>Fang, Qiang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer</atitle><jtitle>Advanced materials (Weinheim)</jtitle><addtitle>Adv. Mater</addtitle><date>2013-09-20</date><risdate>2013</risdate><volume>25</volume><issue>35</issue><spage>4875</spage><epage>4878</epage><pages>4875-4878</pages><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>A non‐porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><pmid>23857724</pmid><doi>10.1002/adma.201302021</doi><tpages>4</tpages></addata></record>
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subjects Amorphous structure
Dielectric constant
Dielectric loss
Dielectrics
Fluoropolymers
Insulators
low k materials
Materials science
Mechanical properties
Thermal stability
Thin films
thin solid films
title Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T05%3A32%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Non-Porous%20Low-k%20Dielectric%20Films%20Based%20on%20a%20New%20Structural%20Amorphous%20Fluoropolymer&rft.jtitle=Advanced%20materials%20(Weinheim)&rft.au=Yuan,%20Chao&rft.date=2013-09-20&rft.volume=25&rft.issue=35&rft.spage=4875&rft.epage=4878&rft.pages=4875-4878&rft.issn=0935-9648&rft.eissn=1521-4095&rft_id=info:doi/10.1002/adma.201302021&rft_dat=%3Cproquest_cross%3E1438569761%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c5101-ae7dbd0f6dd802175564946e456032f053ebea78735fbcd1ac507cd8a57604873%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2562149247&rft_id=info:pmid/23857724&rfr_iscdi=true