Backscattered electrons from gold surface films deposited on silicon substrates: a joint experimental and computational investigation to add new potentiality to electron microscopy

This paper addresses the problem of the thickness determination of thin gold overlayers deposited on silicon bulk substrates by looking at the electron backscattering coefficient involved in scanning electron microscopy (SEM). A Monte Carlo code, used to calculate the backscattering coefficient, tog...

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Bibliographic Details
Published in:Surface and interface analysis 2013-02, Vol.45 (2), p.677-681
Main Authors: Dapor, Maurizio, Bazzanella, Nicola, Toniutti, Laura, Miotello, Antonio, Crivellari, Michele, Gialanella, Stefano
Format: Article
Language:English
Subjects:
applications of Monte Carlo methods
Backscattering
Coefficients
Computational techniques
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Deposition
Electron diffraction and scattering
electron-impact emission phenomena
Exact sciences and technology
Gold
Interface analysis
Mathematical methods in physics
Monte carlo and statistical methods
Physics
Scanning electron microscopy
Silicon substrates
Structure of solids and liquids
crystallography
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Summary:This paper addresses the problem of the thickness determination of thin gold overlayers deposited on silicon bulk substrates by looking at the electron backscattering coefficient involved in scanning electron microscopy (SEM). A Monte Carlo code, used to calculate the backscattering coefficient, together with a simple experimental setup, which uses a conventional SEM, allow to determine thin film thickness (in the range 25–200 nm) with an estimated accuracy of 20%. This adds obviously new potentiality to SEM. Copyright © 2012 John Wiley & Sons, Ltd.
ISSN:0142-2421
1096-9918
DOI:10.1002/sia.5144