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Thermal stability studies of ion beam sputter deposited C/B4C X-ray multilayer mirror

We report the results of thermal stability study carried out on C/B4C multilayer structure. We have analyzed the structure of as-deposited and vacuum annealed C/B4C multilayer film by soft X-ray reflectivity measurements. We observed that multilayer period expansion continues till 600°C and slight c...

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Bibliographic Details
Published in:Thin solid films 2013-01, Vol.527, p.244-249
Main Authors: Rao, P.N., Modi, M.H., Rai, S.K., Sathe, V.G., Deb, S.K., Lodha, G.S.
Format: Article
Language:English
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Summary:We report the results of thermal stability study carried out on C/B4C multilayer structure. We have analyzed the structure of as-deposited and vacuum annealed C/B4C multilayer film by soft X-ray reflectivity measurements. We observed that multilayer period expansion continues till 600°C and slight contraction at higher annealing temperature. The results show that the multilayer structure is stable even after 700°C annealing. Raman spectroscopy indicates graphitization of carbon layer with increasing annealing temperature. Graphitization of carbon results in increases of layer thickness and decreases in density as also observed by soft X-ray reflectivity. We observed reduction in measured soft X-ray reflectivity at 6.56 and 4.39nm wavelengths after 800°C annealing. C/B4C multilayer structure has been tested over a period of one year to investigate its temporal stability. ► We reported the experimental results on thermal stability of C/B4C combination. ► Multilayer structure is stable even after 700°C annealing. ► C/B4C can be used as a stable multilayer mirror both in soft and hard X-ray regions. ► C/B4C multilayer structure has shown good temporal stability.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2012.12.033