Loading…

Substrate hardness dependency on properties of Al2O3 thick films grown by aerosol deposition

The effects of substrate hardness on the growth of Al2O3 films using an aerosol deposition (AD) process were investigated. Substrates with different hardness, such as glass, Cu, Al2O3, and sapphire were used to examine the effects of the deposition rate, microstructure, and mechanical properties of...

Full description

Saved in:
Bibliographic Details
Published in:Surface & coatings technology 2012-09, Vol.209, p.160-168
Main Authors: Lee, Dong-Won, Kim, Hyung-Jun, Kim, Yong-Nam, Jeon, Min-Seok, Nam, Song-Min
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473
cites cdi_FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473
container_end_page 168
container_issue
container_start_page 160
container_title Surface & coatings technology
container_volume 209
creator Lee, Dong-Won
Kim, Hyung-Jun
Kim, Yong-Nam
Jeon, Min-Seok
Nam, Song-Min
description The effects of substrate hardness on the growth of Al2O3 films using an aerosol deposition (AD) process were investigated. Substrates with different hardness, such as glass, Cu, Al2O3, and sapphire were used to examine the effects of the deposition rate, microstructure, and mechanical properties of Al2O3 films. As the substrate hardness increased, the deposition rate and the hardness of the films rapidly decreased, but the surface roughness was increased. The adhesive properties of Al2O3 films deposited on sapphire substrates deteriorated compared to those deposited on Cu substrates. To clarify the causes for this behavior, the relationship between the thickness of films and substrate hardness was investigated, and the microstructures of Al2O3 particles at the initial stages were observed. It was revealed that it was difficult to make anchoring layers with Al2O3 particles deposited on hard sapphire substrates. This is the main cause for the lower deposition rate and the more pronounced deterioration of the mechanical properties. In order to improve the deposition rate of Al2O3 films when growing them on hard substrates, two methods were attempted to increase the kinetic energy of particles. The first method involved the use of larger Al2O3 particles, and the second involved increasing the impact velocity of the particles by using specially designed nozzles. Consequently, dense and hard Al2O3 thick films could be successfully fabricated on hard sapphire substrates at room temperature by the AD process through increasing the impact velocity using the acceleration nozzle. ► The substrate hardness dependency of Al2O3 films formed by aerosol deposition is investigated. ► Al2O3 films deposited on hard substrates show inferior mechanical properties. ► This behavior is related to the difficulty in forming the anchoring layer. ► Two methods for improvement of the mechanical properties are proposed. ► The mechanical properties are improved by using accelerated nozzles.
doi_str_mv 10.1016/j.surfcoat.2012.08.012
format article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1671521145</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0257897212007876</els_id><sourcerecordid>1671521145</sourcerecordid><originalsourceid>FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473</originalsourceid><addsrcrecordid>eNqFkMtu1DAUhi0EEsPAKyBvkLpJ6lviZEdVtVCpUheFHZJlO8fUQyYefDxF8_b1aEq3Xf2b_3LOR8hnzlrOeH--aXGfg0-2tIJx0bKhrfKGrPigx0ZKpd-SFROdboZRi_fkA-KGMcb1qFbk1_3eYcm2AH2weVoAkU6wg2WCxR9oWugupx3kEgFpCvRiFneSlofo_9AQ5y3S3zn9W6g7UAs5YZqP8YSxxLR8JO-CnRE-Peua_Ly--nH5vbm9-3ZzeXHbeMm60oByTDLNpxCq6KGzqpO9050IwikhpWQ89KMCp5ybhn7Unjs-sZ53zCml5ZqcnXrrrX_3gMVsI3qYZ7tA2qPhvead4LzWrkl_svp6LGYIZpfj1uaD4cwccZqN-Y_THHEaNpgqNfjlecOit3PIdvERX9Ki75iWilff15MP6sOPEbJBHytLmGIGX8yU4mtTT9Ujjqg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1671521145</pqid></control><display><type>article</type><title>Substrate hardness dependency on properties of Al2O3 thick films grown by aerosol deposition</title><source>ScienceDirect Freedom Collection</source><creator>Lee, Dong-Won ; Kim, Hyung-Jun ; Kim, Yong-Nam ; Jeon, Min-Seok ; Nam, Song-Min</creator><creatorcontrib>Lee, Dong-Won ; Kim, Hyung-Jun ; Kim, Yong-Nam ; Jeon, Min-Seok ; Nam, Song-Min</creatorcontrib><description>The effects of substrate hardness on the growth of Al2O3 films using an aerosol deposition (AD) process were investigated. Substrates with different hardness, such as glass, Cu, Al2O3, and sapphire were used to examine the effects of the deposition rate, microstructure, and mechanical properties of Al2O3 films. As the substrate hardness increased, the deposition rate and the hardness of the films rapidly decreased, but the surface roughness was increased. The adhesive properties of Al2O3 films deposited on sapphire substrates deteriorated compared to those deposited on Cu substrates. To clarify the causes for this behavior, the relationship between the thickness of films and substrate hardness was investigated, and the microstructures of Al2O3 particles at the initial stages were observed. It was revealed that it was difficult to make anchoring layers with Al2O3 particles deposited on hard sapphire substrates. This is the main cause for the lower deposition rate and the more pronounced deterioration of the mechanical properties. In order to improve the deposition rate of Al2O3 films when growing them on hard substrates, two methods were attempted to increase the kinetic energy of particles. The first method involved the use of larger Al2O3 particles, and the second involved increasing the impact velocity of the particles by using specially designed nozzles. Consequently, dense and hard Al2O3 thick films could be successfully fabricated on hard sapphire substrates at room temperature by the AD process through increasing the impact velocity using the acceleration nozzle. ► The substrate hardness dependency of Al2O3 films formed by aerosol deposition is investigated. ► Al2O3 films deposited on hard substrates show inferior mechanical properties. ► This behavior is related to the difficulty in forming the anchoring layer. ► Two methods for improvement of the mechanical properties are proposed. ► The mechanical properties are improved by using accelerated nozzles.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/j.surfcoat.2012.08.012</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Aerosol deposition ; Aerosols ; Al2O3 ; Aluminum oxide ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Deposition rate ; Exact sciences and technology ; Hardness ; Impact velocity ; Materials science ; Microstructure ; Physics ; Sapphire ; Surface treatments ; Thick films</subject><ispartof>Surface &amp; coatings technology, 2012-09, Vol.209, p.160-168</ispartof><rights>2012 Elsevier B.V.</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473</citedby><cites>FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=26507341$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lee, Dong-Won</creatorcontrib><creatorcontrib>Kim, Hyung-Jun</creatorcontrib><creatorcontrib>Kim, Yong-Nam</creatorcontrib><creatorcontrib>Jeon, Min-Seok</creatorcontrib><creatorcontrib>Nam, Song-Min</creatorcontrib><title>Substrate hardness dependency on properties of Al2O3 thick films grown by aerosol deposition</title><title>Surface &amp; coatings technology</title><description>The effects of substrate hardness on the growth of Al2O3 films using an aerosol deposition (AD) process were investigated. Substrates with different hardness, such as glass, Cu, Al2O3, and sapphire were used to examine the effects of the deposition rate, microstructure, and mechanical properties of Al2O3 films. As the substrate hardness increased, the deposition rate and the hardness of the films rapidly decreased, but the surface roughness was increased. The adhesive properties of Al2O3 films deposited on sapphire substrates deteriorated compared to those deposited on Cu substrates. To clarify the causes for this behavior, the relationship between the thickness of films and substrate hardness was investigated, and the microstructures of Al2O3 particles at the initial stages were observed. It was revealed that it was difficult to make anchoring layers with Al2O3 particles deposited on hard sapphire substrates. This is the main cause for the lower deposition rate and the more pronounced deterioration of the mechanical properties. In order to improve the deposition rate of Al2O3 films when growing them on hard substrates, two methods were attempted to increase the kinetic energy of particles. The first method involved the use of larger Al2O3 particles, and the second involved increasing the impact velocity of the particles by using specially designed nozzles. Consequently, dense and hard Al2O3 thick films could be successfully fabricated on hard sapphire substrates at room temperature by the AD process through increasing the impact velocity using the acceleration nozzle. ► The substrate hardness dependency of Al2O3 films formed by aerosol deposition is investigated. ► Al2O3 films deposited on hard substrates show inferior mechanical properties. ► This behavior is related to the difficulty in forming the anchoring layer. ► Two methods for improvement of the mechanical properties are proposed. ► The mechanical properties are improved by using accelerated nozzles.</description><subject>Aerosol deposition</subject><subject>Aerosols</subject><subject>Al2O3</subject><subject>Aluminum oxide</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Deposition rate</subject><subject>Exact sciences and technology</subject><subject>Hardness</subject><subject>Impact velocity</subject><subject>Materials science</subject><subject>Microstructure</subject><subject>Physics</subject><subject>Sapphire</subject><subject>Surface treatments</subject><subject>Thick films</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqFkMtu1DAUhi0EEsPAKyBvkLpJ6lviZEdVtVCpUheFHZJlO8fUQyYefDxF8_b1aEq3Xf2b_3LOR8hnzlrOeH--aXGfg0-2tIJx0bKhrfKGrPigx0ZKpd-SFROdboZRi_fkA-KGMcb1qFbk1_3eYcm2AH2weVoAkU6wg2WCxR9oWugupx3kEgFpCvRiFneSlofo_9AQ5y3S3zn9W6g7UAs5YZqP8YSxxLR8JO-CnRE-Peua_Ly--nH5vbm9-3ZzeXHbeMm60oByTDLNpxCq6KGzqpO9050IwikhpWQ89KMCp5ybhn7Unjs-sZ53zCml5ZqcnXrrrX_3gMVsI3qYZ7tA2qPhvead4LzWrkl_svp6LGYIZpfj1uaD4cwccZqN-Y_THHEaNpgqNfjlecOit3PIdvERX9Ki75iWilff15MP6sOPEbJBHytLmGIGX8yU4mtTT9Ujjqg</recordid><startdate>20120925</startdate><enddate>20120925</enddate><creator>Lee, Dong-Won</creator><creator>Kim, Hyung-Jun</creator><creator>Kim, Yong-Nam</creator><creator>Jeon, Min-Seok</creator><creator>Nam, Song-Min</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QQ</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20120925</creationdate><title>Substrate hardness dependency on properties of Al2O3 thick films grown by aerosol deposition</title><author>Lee, Dong-Won ; Kim, Hyung-Jun ; Kim, Yong-Nam ; Jeon, Min-Seok ; Nam, Song-Min</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Aerosol deposition</topic><topic>Aerosols</topic><topic>Al2O3</topic><topic>Aluminum oxide</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition</topic><topic>Deposition rate</topic><topic>Exact sciences and technology</topic><topic>Hardness</topic><topic>Impact velocity</topic><topic>Materials science</topic><topic>Microstructure</topic><topic>Physics</topic><topic>Sapphire</topic><topic>Surface treatments</topic><topic>Thick films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lee, Dong-Won</creatorcontrib><creatorcontrib>Kim, Hyung-Jun</creatorcontrib><creatorcontrib>Kim, Yong-Nam</creatorcontrib><creatorcontrib>Jeon, Min-Seok</creatorcontrib><creatorcontrib>Nam, Song-Min</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface &amp; coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lee, Dong-Won</au><au>Kim, Hyung-Jun</au><au>Kim, Yong-Nam</au><au>Jeon, Min-Seok</au><au>Nam, Song-Min</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Substrate hardness dependency on properties of Al2O3 thick films grown by aerosol deposition</atitle><jtitle>Surface &amp; coatings technology</jtitle><date>2012-09-25</date><risdate>2012</risdate><volume>209</volume><spage>160</spage><epage>168</epage><pages>160-168</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>The effects of substrate hardness on the growth of Al2O3 films using an aerosol deposition (AD) process were investigated. Substrates with different hardness, such as glass, Cu, Al2O3, and sapphire were used to examine the effects of the deposition rate, microstructure, and mechanical properties of Al2O3 films. As the substrate hardness increased, the deposition rate and the hardness of the films rapidly decreased, but the surface roughness was increased. The adhesive properties of Al2O3 films deposited on sapphire substrates deteriorated compared to those deposited on Cu substrates. To clarify the causes for this behavior, the relationship between the thickness of films and substrate hardness was investigated, and the microstructures of Al2O3 particles at the initial stages were observed. It was revealed that it was difficult to make anchoring layers with Al2O3 particles deposited on hard sapphire substrates. This is the main cause for the lower deposition rate and the more pronounced deterioration of the mechanical properties. In order to improve the deposition rate of Al2O3 films when growing them on hard substrates, two methods were attempted to increase the kinetic energy of particles. The first method involved the use of larger Al2O3 particles, and the second involved increasing the impact velocity of the particles by using specially designed nozzles. Consequently, dense and hard Al2O3 thick films could be successfully fabricated on hard sapphire substrates at room temperature by the AD process through increasing the impact velocity using the acceleration nozzle. ► The substrate hardness dependency of Al2O3 films formed by aerosol deposition is investigated. ► Al2O3 films deposited on hard substrates show inferior mechanical properties. ► This behavior is related to the difficulty in forming the anchoring layer. ► Two methods for improvement of the mechanical properties are proposed. ► The mechanical properties are improved by using accelerated nozzles.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2012.08.012</doi><tpages>9</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0257-8972
ispartof Surface & coatings technology, 2012-09, Vol.209, p.160-168
issn 0257-8972
1879-3347
language eng
recordid cdi_proquest_miscellaneous_1671521145
source ScienceDirect Freedom Collection
subjects Aerosol deposition
Aerosols
Al2O3
Aluminum oxide
Cross-disciplinary physics: materials science
rheology
Deposition
Deposition rate
Exact sciences and technology
Hardness
Impact velocity
Materials science
Microstructure
Physics
Sapphire
Surface treatments
Thick films
title Substrate hardness dependency on properties of Al2O3 thick films grown by aerosol deposition
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T09%3A01%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Substrate%20hardness%20dependency%20on%20properties%20of%20Al2O3%20thick%20films%20grown%20by%20aerosol%20deposition&rft.jtitle=Surface%20&%20coatings%20technology&rft.au=Lee,%20Dong-Won&rft.date=2012-09-25&rft.volume=209&rft.spage=160&rft.epage=168&rft.pages=160-168&rft.issn=0257-8972&rft.eissn=1879-3347&rft.coden=SCTEEJ&rft_id=info:doi/10.1016/j.surfcoat.2012.08.012&rft_dat=%3Cproquest_cross%3E1671521145%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c305t-e4b03071dff307785a4536b752f2b4233301f694eb4bbd8697c1b1d06150b4473%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1671521145&rft_id=info:pmid/&rfr_iscdi=true