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Structural Characterization of Electrodeposited Nanostructured Titanium Dioxide thin Films on Stainless Steel and on Indium Tin Oxide (ITO)

Nanostructured TiO^sub 2^ thin films are fabricated directly by an anodic electrodeposition using an aqueous TiCl^sub 3^ solution. TiO^sub 2^ thin films were deposited on stainless steel and indium tin oxide (ITO) substrates. As deposited, all TiO^sub 2^ films were amorphous. For TiO^sub 2^/stainles...

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Bibliographic Details
Published in:Sensors & transducers 2014-05, Vol.27 (5), p.137-137
Main Authors: El Moursli, Fouzia Cherkaoui, Douayar, Abdeslam, Hajji, Faiza, Nouneh, Khalid, Guessous, Aicha, Nabih, Khadija, Hadri, Adil, Abd-Lefdil, Mohammed
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Language:English
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Summary:Nanostructured TiO^sub 2^ thin films are fabricated directly by an anodic electrodeposition using an aqueous TiCl^sub 3^ solution. TiO^sub 2^ thin films were deposited on stainless steel and indium tin oxide (ITO) substrates. As deposited, all TiO^sub 2^ films were amorphous. For TiO^sub 2^/stainless annealed at 350 degrees Celsius, XRD patterns show both anatase and rutile phases. While, only anatase phase subsists for annealing temperature at 450 degrees Celsius and 500 degrees Celsius. The calculated grain sizes are around 20nm. By AFM analysis, surface root mean square roughness obtained for TiO^sub 2^/Steel is around 56 nm and decrease with annealing to 30 nm. For TiO^sub 2^ thin films deposited on ITO and annealed at 350 degrees Celsius, 450 degrees Celsius, and 500 degrees Celsius, only orthorhombic single phase is observed with grains size of about 25 nm. The rms of as-deposited TiO^sub 2^/ITO around 60 nm decrease with annealing to 40 nm confirming that annealing process improves the roughness of the as deposited samples.
ISSN:2306-8515
1726-5479