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Electrical conductivity enhancement of spin-coated PEDOT:PSS thin film via dipping method in low concentration aqueous DMSO
ABSTRACT The electrical conductivity of poly(3,4‐ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) was enhanced by dipping the thin films prepared by spin coating technique in an aqueous DMSO solution. The low concentration range of DMSO in water between 0–5 vol % was studied in comparison...
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Published in: | Journal of applied polymer science 2015-06, Vol.132 (24), p.np-n/a |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
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Online Access: | Get full text |
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Summary: | ABSTRACT
The electrical conductivity of poly(3,4‐ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) was enhanced by dipping the thin films prepared by spin coating technique in an aqueous DMSO solution. The low concentration range of DMSO in water between 0–5 vol % was studied in comparison with pure water and pure DMSO. It was found that the electrical conductivity dramatically increased as increasing the concentration of DMSO and reached the constant value of 350 S cm−1 at 2 vol % of aqueous DMSO solution. This could be explained by the conformational change of PEDOT chains from the coil structure to the linear or expanded coil structure as confirmed by Raman spectra. Further, white patches were obviously noticed on the surface of the films dipped in pure DMSO, indicating the phase separation of conductive PEDOT grains and associated PSS. The sulfur element of the dipped film surface was investigated by XPS. The XPS S2p core‐level spectra displayed that the unassociated PSS was considerably removed from the surface of PEDOT:PSS films dipped in pure water and 2 vol % of aqueous DMSO solution, indicating that the presence of water in the solvents is important to prominently promote the washing effect. Finally, UV–Vis spectra revealed the improved transparency of the films probably owing to the decreased film thickness. © 2015 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2015, 132, 42108. |
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ISSN: | 0021-8995 1097-4628 |
DOI: | 10.1002/app.42108 |