Solution-Refined Method for Electrostatic Potential Distribution of Large-Scale Electron Optics

The solution-refined method is developed to solve electrostatic fields of the electron-beam direct-write lithography system. The prediction of accurate electron trajectories and the geometry of the developed photoresist patterns rely on high-resolution electrostatic fields in the whole system. Consi...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2013-05, Vol.52 (5), p.055202-055202-8
Main Authors: Lee, Yen-Min, Li, Jia-Han, Sheu, Tony Wen-Hann, Tsai, Kuen-Yu, Yen, Jia-Yush
Format: Article
Language:English
Subjects:
Central processing units
Computation
Electron beam lithography
Electron optics
Electrostatic fields
Electrostatics
Photoresists
Symmetry
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Summary:The solution-refined method is developed to solve electrostatic fields of the electron-beam direct-write lithography system. The prediction of accurate electron trajectories and the geometry of the developed photoresist patterns rely on high-resolution electrostatic fields in the whole system. Considering fabrication errors, such electrostatic fields cannot be solved using a cylindrical symmetry. Thus, this problem is a multiscale problem that requires a huge computer memory to solve. In our cases, the minimum number of grids of 1 nm length are applied and the total memory required approaches 75 Gbyte. Since the proposed solution-refined technique has a tradeoff with computational time, fewer central processing units (CPUs) are needed to solve this system because each CPU that solves the problem exceeds its available storage memory. The proposed technique can be used to solve the electron-beam direct-write lithography system at higher resolution and the problems exceed the available storage memory.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.52.055202