An in situ vapour phase hydrothermal surface doping approach for fabrication of high performance Co sub(3)O sub(4) electrocatalysts with an exceptionally high S-doped active surface

A facile in situ vapour phase hydrothermal (VPH) surface doping approach has been developed for fabrication of high performance S-doped Co sub(3)O sub(4) electrocatalysts with an unprecedentedly high surface S content (>47%). The demonstrated VPH doping approach could be useful for enrichment of...

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2015-03, Vol.51 (26), p.5695-5697
Main Authors: Tan, Zhijin, Liu, Porun, Zhang, Haimin, Wang, Yun, Al-Mamun, Mohammad, Yang, Hua Gui, Wang, Dan, Tang, Zhiyong, Zhao, Huijun
Format: Article
Language:English
Subjects:
Doping
Electrocatalysts
Enrichment
Metal oxides
Surface chemistry
Online Access:Get full text
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Summary:A facile in situ vapour phase hydrothermal (VPH) surface doping approach has been developed for fabrication of high performance S-doped Co sub(3)O sub(4) electrocatalysts with an unprecedentedly high surface S content (>47%). The demonstrated VPH doping approach could be useful for enrichment of surface active sites for other metal oxide electrocatalysts.
ISSN:1359-7345
1364-548X
DOI:10.1039/c5cc00661a