The Fabrication of Codoped ZnO Thin Films by DC Magnetron Sputtering

The codoped ZnO thin film were deposited by DC magnetron sputtering on silicon (111) followed by annealing treatment at 400 °C and 600 °C for 1 hour in nitrogen and oxygen gas mixture. Structural investigation was carried out by scanning electron microscopy (SEM) and X ray diffraction (XRD). Film ro...

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Bibliographic Details
Published in:Key engineering materials 2013-12, Vol.594-595, p.958-961
Main Authors: Hamid, Haslinda Abdul, Hadi, Mohd Nasir Abdul, Yee, Hooi Min
Format: Article
Language:English
Subjects:
Annealing
Deposition
Direct current
Magnetron sputtering
Scanning electron microscopy
Thin films
X-ray diffraction
Zinc oxide
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Summary:The codoped ZnO thin film were deposited by DC magnetron sputtering on silicon (111) followed by annealing treatment at 400 °C and 600 °C for 1 hour in nitrogen and oxygen gas mixture. Structural investigation was carried out by scanning electron microscopy (SEM) and X ray diffraction (XRD). Film roughness (r.m.s) and grain shape were found to be correlated with the annealing temperatures. SEM result has shown that its surface characteristics are strongly influenced by annealing temperatures.
ISSN:1013-9826
1662-9795
1662-9795
DOI:10.4028/www.scientific.net/KEM.594-595.958