Process modeling for advanced device technologies

Front end process simulation is an invaluable tool in assessing current and future process options. This review describes the application of process simulation in modeling geometry, doping and stress effects in advanced logic processes. Continuum and atomistic approaches, both necessary to capture t...

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Bibliographic Details
Published in:Journal of computational electronics 2014-03, Vol.13 (1), p.18-32
Main Authors: Cea, S. M., Botelho, S., Chaudhry, A., Fleischmann, P., Giles, M. D., Grigoriev, A., Kaushik, A., Keys, P. H., Kennel, H. W., Lilak, A. D., Mehandru, R., Stettler, M., Voinov, B., Voynich, N., Weber, C., Zhavoronok, N.
Format: Article
Language:English
Subjects:
Annealing
Computation
Computer simulation
Continuums
Devices
Doping
Electrical Engineering
Engineering
Ion implantation
Logic
Mathematical and Computational Engineering
Mathematical and Computational Physics
Mathematical models
Mechanical Engineering
Optical and Electronic Materials
Partial differential equations
Point defects
Robustness (mathematics)
Simulation
Theoretical
Topography
Transistors
Transplants & implants
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Description
Summary:Front end process simulation is an invaluable tool in assessing current and future process options. This review describes the application of process simulation in modeling geometry, doping and stress effects in advanced logic processes. Continuum and atomistic approaches, both necessary to capture the physics involved with the most advanced options, are discussed. Also detailed are advancements in numerical techniques which enable the efficient and robust simulation necessary to keep pace with technology development.
ISSN:1569-8025
1572-8137
DOI:10.1007/s10825-013-0491-6