High-Performance MIM Capacitors With Nanomodulated Electrode Surface

We report on a high-performance metal-insulator- metal (MIM) capacitor using a barrier-type anodic alumina as dielectric and exhibiting a capacitance density as high as 10 fF/μm 2 with leakage current density lower than 10 -8 A/cm 2 . The device is shown to be very stable in terms of frequency, show...

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Bibliographic Details
Published in:IEEE transactions on electron devices 2015-05, Vol.62 (5), p.1568-1573
Main Authors: Hourdakis, Emmanouel, Travlos, Anastassios, Nassiopoulou, Androula G.
Format: Article
Language:English
Subjects:
Aluminum oxide
Anodic alumina
Capacitance
Capacitors
Density
Devices
Dielectrics
Electrodes
Fabrication
high-k dielectric
Leakage current
Leakage currents
metal-insulator-metal (MIM) capacitor
MIM capacitors
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Summary:We report on a high-performance metal-insulator- metal (MIM) capacitor using a barrier-type anodic alumina as dielectric and exhibiting a capacitance density as high as 10 fF/μm 2 with leakage current density lower than 10 -8 A/cm 2 . The device is shown to be very stable in terms of frequency, showing a capacitance variation less than 3% in the frequency range between 10 3 and 10 6 Hz. A loss tangent
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2015.2411771