Improvement of temperature coefficient of resistance of a VO sub(2) film on an SiN/polyimide/Si substrate by excimer laser irradiation for IR sensors

• Published in: Japanese Journal of Applied Physics 2014-01, Vol.53 (5S1), p.05FB15-1-05FB15-4
• Main Authors: Ishizaki, Haruo, Nakajima, Tomohiko, Shinoda, Kentaro, Tohyama, Shigeru, Kurashina, Seiji, Miyoshi, Masaru, Sasaki, Tokuhito, Tsuchiya, Tetsuo
• Format: Article
• Language: English
• Subjects: Coefficients; Electrical resistivity; Lasers; Polyimide resins; Sensors; Shot; Silicon substrates; Sputtering; Vanadium oxides
• ISSN: 0021-4922; 1347-4065
• DOI: 10.7567/JJAP.53.05FB15

Using a laser-assisted sputtering process, we have successfully prepared a VO sub(2) film on a SiN/polyimide/Si substrate. We investigated the effects of laser fluence and shot number on the crystallization and temperature coefficient of resistance (TCR) of the deposited VO sub(2) films. At a constant shot number (2500 pulses), the resistivity of the film decreased from 50 to 60mJ/cm super(2), and that of the film increased with an increase from 70 to 80mJ/cm super(2). At 50mJ/cm super(2), the resistivity decreased with increasing shot number. TCR at 30 [degrees]C of the amorphous VO sub(2) film on a SiN/polyimide/Si substrate prepared by KrF laser irradiation at 50mJ/cm super(2) for 4150 pulses at room temperature is 1.73%/K. In addition, TCR of the film prepared at 70mJ/cm super(2) was 3.36%/K at 40 [degrees]C. This TCR of the film is much higher than that of the film (1.70%/K) prepared by thermal annealing, which is used in the present IR sensor. The VO sub(2) films prepared by laser sputtering are promising materials for IR sensors, which are increasingly used in industry.