Microscopic lithography with pixelate diffraction of a digital micro-mirror device for micro-lens fabrication

The irradiance in microscopic lithography using a digital micro-mirror device (DMD) as a virtual digital mask generator is influenced by diffraction effects that have been exploited to fabricate microstructures. Based on the established model, the theoretical analysis and simulation of DMD diffracti...

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Bibliographic Details
Published in:Applied optics (2004) 2014-08, Vol.53 (24), p.5307-5311
Main Authors: Ding, Xiang-Yu, Ren, Yu-Xuan, Gong, Lei, Fang, Zhao-Xiang, Lu, Rong-De
Format: Article
Language:English
Subjects:
Computer simulation
Computer-Aided Design
Curing
Devices
Diffraction
Digital
Equipment Design
Equipment Failure Analysis
Feasibility
Lenses
Lithography
Microstructure
Miniaturization
Photography - instrumentation
Photoresists
Refractometry - instrumentation
Signal Processing, Computer-Assisted - instrumentation
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Summary:The irradiance in microscopic lithography using a digital micro-mirror device (DMD) as a virtual digital mask generator is influenced by diffraction effects that have been exploited to fabricate microstructures. Based on the established model, the theoretical analysis and simulation of DMD diffraction characteristics has been studied. A novel method without masking to fabricate a micro-lens by pixilation of micro-mirrors inside the DMDs used in microscopic lithography has been proposed. It is a method of precise control of photon-induced curing behavior of photoresist by full use of diffraction effects and verification of the feasibility of the fabrication method based on diffraction. The introduced method provides an option for accurate and flexible micro-fabrication of microstructures.
ISSN:1559-128X
2155-3165
DOI:10.1364/AO.53.005307