Comparison of Electrochemical Luminescence Characteristics of Titanium Dioxide Films Prepared by Sputtering and Sol--Gel Combustion Methods

• Published in: Japanese Journal of Applied Physics 2013-05, Vol.52 (5), p.05EC04-05EC04-6
• Main Authors: Park, Hee-Dae, Sung, Youl-Moon, Park, Min-Woo, Song, Jae-Eun
• Format: Article
• Language: English
• Subjects: Combustion; Deposition; Emission; Luminescence; Porosity; Sol gel process; Sputtering; Titanium dioxide
• ISSN: 0021-4922; 1347-4065
• DOI: 10.7567/JJAP.52.05EC04

Titanium dioxide (TiO 2 ) films were deposited on fluorine-doped tin-oxide (FTO) glass by sputtering and sol--gel combustion (SGC) coating methods and investigated with respect to their electrochemical luminescence (ECL) performance. The sputtered TiO 2 films were denser than the SGC-deposited films, while the SGC films were found to be superior in porosity to the sputtered films. The charge transfer resistance ($R_{2}$) of the SGC (450 °C) TiO 2 -based cell was found to be lower than those of the sputtered TiO 2 -based cells. The SGC (450 °C) cell emitted a more intense ECL than the sputter (450 °C) cells. The threshold voltage at which the emission starts was 3.0 V for the SGC (450 °C) cell, which was lower than that (3.5 V) for the sputter (450 °C) cell. The efficiencies were 0.04 lm/W for the sputter (450 °C) cell ($R_{2} = 22.3$ $\Omega$, $\text{porosity}= 27.2$%) and 0.085 lm/W for the SGC (450 °C) cell ($R_{2} = 12.8$ $\Omega$, $\text{porosity}= 65.8$%). The SGC-deposited TiO 2 films were found to be superior in ECL efficiency to the sputtered TiO 2 films.